Materials including semiconductor nanocrystals

• US 8,535,758 B2
• Filed: 12/19/2007
• Issued: 09/17/2013
• Est. Priority Date: 11/07/2002
• Status: Active Grant

• Current Assignee: Massachusetts Institute of Technology
• Original Assignee: Massachusetts Institute of Technology
• Inventors: Bulovic, Vladimir, Coe-Sullivan, Seth, Woo, Wing-Keung, Bawendi, Moungi G.
• Primary Examiner(s): Jolley, Kirsten
• Application Number:
  US11/959,853
• Publication Number:
  US 20130216707A1
• Time in Patent Office: 2,099 Days
• Field of Search: 427/240, 427/425, 427/407.1
• US Class Current: 427/240
• CPC Class Codes: B05D 1/005 Spin coating
• CPC Class Codes: B05D 1/34 Applying different liquids or other fluent materials simultaneously
• CPC Class Codes: B05D 7/52 Two layers
• CPC Class Codes: B22F 1/054 Nanosized particles
• CPC Class Codes: B22F 1/102 Metallic powder coated with organic material
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: H10K 50/11 characterised by the electroluminescent [EL] layers
• CPC Class Codes: H10K 50/14 Carrier transporting layers
• CPC Class Codes: Y10T 428/24893 including particulate material
• CPC Class Codes: Y10T 428/24909 Free metal or mineral containing
• CPC Class Codes: Y10T 428/25 Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
• CPC Class Codes: Y10T 428/256 Heavy metal or aluminum or compound thereof
• CPC Class Codes: Y10T 428/258 Alkali metal or alkaline earth metal or compound thereof

Abstract

A composition includes a layer of nanoparticles and a layer of a second material.

Claims

1. A method of manufacturing a layered device comprising:

depositing a film-forming solution on a substrate to form two layers from the film-forming solution, the film-forming solution including a first material and a second material, wherein the first material includes a matrix material and the second material includes a plurality of nanoparticles; and

forming a bilayer structure from the single film-forming solution by phase segregation, wherein the bilayer structure includes a layer of the first material including the matrix material and a layer of the second material including the plurality of nanoparticles.

2. The method of claim 1, wherein one layer is a discontinuous layer including the nanoparticles.

3. The method of claim 1, wherein one layer is a continuous layer including the nanoparticles.

4. The method of claim 1, wherein the plurality of nanoparticles is a plurality of semiconductor nanoparticles.

5. The method of claim 1, wherein the plurality of nanoparticles is a plurality of metallic nanoparticles.

6. The method of claim 1, wherein the plurality of nanoparticles is a plurality of ceramic nanoparticles.

7. The method of claim 1, wherein the layer of the second material including a plurality of nanoparticles is a monolayer.

8. The method of claim 1, wherein the matrix material is non-polymeric.

9. The method of claim 1, wherein each nanoparticle has a ligand bonded to its surface having the formula:

10. A method of forming a layered structure comprising:

selecting a matrix material and a plurality of nanoparticles which are mutually immiscible;

dissolving the matrix material and the plurality of nanoparticles in a solvent to form a coating solution;

coating a substrate with the coating solution, and

forming a bilayer structure from the coating solution by phase segregation wherein the bilayer structure includes a monolayer of the plurality of nanoparticles on a layer of the matrix material.

11. The method of claim 10, wherein coating the substrate with the coating solution includes spin coating.

12. The method of claim 10, wherein the nanoparticle is a semiconductor nanoparticle.

13. The method of claim 10, wherein the nanoparticle is a metallic nanoparticle.

14. The method of claim 10, wherein the nanoparticle is a ceramic nanoparticle.

15. A method of manufacturing a layered device comprising:

depositing a film-forming solution including a first material and a second material on a substrate to form two layers from the film-forming solution, a layer of the first material and a layer of the second material, wherein the first material includes a matrix material and the second material includes a plurality of nanoparticles; and

wherein the layer of the second material including a plurality of nanoparticles is a monolayer.

16. The method of claim 15, wherein one layer is a discontinuous layer including the nanoparticles.

17. The method of claim 15, wherein the plurality of nanoparticles is a plurality of semiconductor nanoparticles.