Thin film transistor, method of manufacturing the same and flat panel display device having the same
First Claim
1. A method of manufacturing a thin film transistor, comprising:
- forming source and drain electrodes on a substrate;
sequentially forming a first interfacial stability layer and an oxide semiconductor layer on the substrate having the source and drain electrodes;
patterning the oxide semiconductor layer to form an active layer;
forming a gate insulating layer on the substrate to cover the active layer; and
forming a gate electrode on the gate insulating layer above the active layer, wherein the first interfacial stability layer is formed of an oxide having a band gap of 3.0 to 8.0 eV, and a portion of the interfacial stability layer is disposed between the source and drain electrodes and the active layer.
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Abstract
A thin film transistor (TFT) using an oxide semiconductor as an active layer, a method of manufacturing the TFT, and a flat panel display device having the TFT include source and drain electrodes formed on a substrate; an active layer formed of an oxide semiconductor disposed on the source and drain electrodes; a gate electrode; and an interfacial stability layer formed on at least one of top and bottom surfaces of the active layer. In the TFT, the interfacial stability layer is formed of an oxide having a band gap of 3.0 to 8.0 eV. Since the interfacial stability layer has the same characteristics as a gate insulating layer and a passivation layer, chemically high interface stability is maintained. Since the interfacial stability layer has a band gap equal to or greater than that of the active layer, charge trapping is physically prevented.
53 Citations
17 Claims
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1. A method of manufacturing a thin film transistor, comprising:
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forming source and drain electrodes on a substrate; sequentially forming a first interfacial stability layer and an oxide semiconductor layer on the substrate having the source and drain electrodes; patterning the oxide semiconductor layer to form an active layer; forming a gate insulating layer on the substrate to cover the active layer; and forming a gate electrode on the gate insulating layer above the active layer, wherein the first interfacial stability layer is formed of an oxide having a band gap of 3.0 to 8.0 eV, and a portion of the interfacial stability layer is disposed between the source and drain electrodes and the active layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of manufacturing a thin film transistor, comprising:
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forming source and drain electrodes on a substrate; sequentially forming an oxide semiconductor layer and an interfacial stability layer on the substrate having the source and drain electrodes; patterning the interfacial stability layer and the oxide semiconductor layer to form an active layer; forming a gate insulating layer on the substrate having the active layer; and forming a gate electrode on the gate insulating layer above the active layer, wherein the interfacial stability layer is formed of an oxide having a band gap of 3.0 to 8.0 eV, and a portion of the interfacial stability layer is disposed between the source and drain electrodes and the active layer. - View Dependent Claims (13, 14, 15, 16, 17)
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Specification