Illumination optimization

• US 8,542,340 B2
• Filed: 07/07/2009
• Issued: 09/24/2013
• Est. Priority Date: 07/07/2008
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Ye, Jun, Cao, Yu, Feng, Hanying
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US13/003,294
• Publication Number:
  US 20110116067A1
• Time in Patent Office: 1,540 Days
• Field of Search: 355/52, 355/53, 355/55, 355 67- 71, 355/77, 430/311, 716/19
• US Class Current: 355/52
• CPC Class Codes: G03F 7/70091 Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
• CPC Class Codes: G03F 7/70441 Optical proximity correction [OPC]
• CPC Class Codes: G03F 7/70666 Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system

Abstract

A method of optimizing an illumination pupil shape for a lithographic process comprises identifying a target pattern to be imaged by said lithographic process. It further comprises identifying at least one optimization point in said target pattern and identifying at least one design for manufacturing metric per optimization point. Additionally, it comprises selecting a set of illumination source points based on the identified at least one design for manufacturing metric and determining the illumination pupil shape based on the selected set of illumination source points.

Claims

1. A method of improving an illumination pupil shape for an illumination source used in a lithographic process, the lithographic process being configured to image a design layout, the method comprising the steps of:

identifying a target pattern included in the design layout;

identifying at least one optimization point in said target pattern, wherein the optimization point comprises a spatial point within the design layout based on which the pupil shape of the illumination source is to be improved;

identifying at least one design for manufacturing metric per optimization point;

selecting a set of illumination source points based on the identified at least one design for manufacturing metric; and

determining the improved illumination pupil shape based on the selected set of illumination source points.

2. The method according to claim 1, comprising identifying a design for manufacturing metric based on at least one of an aerial image intensity slope, a mask error enhancement factor and a derivative of a critical dimension versus parameters of a process window of the lithographic process.

3. The method according to claim 1, further comprising optimizing the target pattern based on the determined illumination pupil shape.

4. The method according to claim 3, wherein optimizing the target pattern results in an optimized target pattern, the method further comprising determining a further set of optimization points based on the optimized target pattern and improving the illumination pupil shape based on the optimized target pattern and the further set of optimization points.

5. The method according to claim 1, comprising:

identifying an acceptable range for each the at least one design for manufacturing metric per optimization point; and

selecting the set of illumination source points for illuminating the target pattern such that the design for manufacturing metric is within the acceptable range for each optimization point and for each design for manufacturing metric.

6. The method according to claim 5, comprising:

sorting the illumination points for each combination of design for manufacturing metric and optimization point to provide a sorted order based on the value of the design for manufacturing metric in the combination;

assembling a plurality of further sets of illumination points by selecting a further set of illumination points per combination of design for manufacturing metric and optimization point based on the sorted order; and

determining the set of illumination points by selecting illumination points from the intersection of further sets of illumination points.

7. The method according to claim 1, comprising:

defining a cost function based on the at least one design for manufacturing metric; and

performing an iteration process comprising;

determining the value of the cost function for an illumination source point; and

improving the illumination pupil shape by adding illumination source points to a set of selected illumination source points based on corresponding values of the cost function until an iteration criterion is met.

8. The method according to claim 7, wherein illumination source points in the set of selected illumination source points are not re-evaluated during a later iteration.

9. The method according to claim 7, comprising:

determining the second order coefficient in a polynomial representation of aerial image intensity (I) as a function of a parameter of a process window of the lithographic process; and

identifying at least one design for manufacturing metric to be the magnitude of the second order coefficient.

10. The method according to claim 8, comprising:

determining a worst case optimization point by determining which optimization point has the largest minimum value for the magnitude of the second order coefficient associated with an individual illumination source point;

selecting the associated individual illumination source point with the minimum value of the magnitude of the second order coefficient for that optimization point; and

selecting a further illumination source point having an opposite effect on the second order coefficient in that optimization point.

11. The method according to claim 7, comprising:

defining interdependency relations between illumination source points based on symmetry in the illumination source; and

selecting interdependent illumination source points based on the interdependency relations.

12. A device manufacturing method comprising:

patterning a beam of radiation from the illumination source with a patterning device that includes the design layout;

exposing a substrate to the patterned beam of radiation; and

using the improved illumination pupil shape for the illumination source determined in claim 1.

13. The device manufacturing method according to claim 12, comprising using an illumination pupil shape filter.

14. The device manufacturing method according to claim 13, comprising:

either using the determined improved illumination pupil shape to program a programmable device in the pupil plane of the illumination source, or

using a diffractive optical element having a diffractive pattern corresponding to the determined illumination pupil shape in the pupil plane of the illuminator source.

15. The method of producing a diffractive optical element, comprising:

determining the improved illumination pupil shape according to claim 1, and

producing a diffractive pattern on the diffractive optical element based on the determined improved illumination pupil shape.

16. A non-transitory computer readable medium bearing a computer program for improving an illumination pupil shape for an illumination source used in a lithographic process, the lithographic process being configured to image a design layout, the computer program, when executed, causing a computer to perform the steps of claim 1.