Methods of patterning a substrate including multilayer antireflection coatings

• US 8,551,808 B2
• Filed: 09/13/2012
• Issued: 10/08/2013
• Est. Priority Date: 06/21/2007
• Status: Active Grant

• Current Assignee: Micron Technology, Inc.
• Original Assignee: Micron Technology, Inc.
• Inventors: Marsh, Eugene P., Millward, Dan B.
• Primary Examiner(s): Ho, Anthony
• Application Number:
  US13/613,358
• Publication Number:
  US 20130011561A1
• Time in Patent Office: 390 Days
• Field of Search: 257/40, 257/E51.001, 438/99
• US Class Current: 438/99
• CPC Class Codes: B32B 25/00 Layered products comprising a layer of natural or synthetic rubber fibrous or filamentary layer made of a natural or synthetic rubber B32B5/02; particulate layer made of a natural or synthetic rubber B32B5/16; foamed layer made of a natural or synthetic rubber B32B5/18
• CPC Class Codes: B81C 1/00206 Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties
• CPC Class Codes: B81C 2201/0149 Forming nanoscale microstructures using auto-arranging or self-assembling material
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: G02B 1/111 using layers comprising organic materials
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
• CPC Class Codes: G03F 7/091 characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
• CPC Class Codes: H01L 21/0276 using an anti-reflective coating anti-reflective coating for lithography in general G03F7/09
• CPC Class Codes: H01L 27/1462 Coatings
• CPC Class Codes: H01L 31/02162 for filtering or shielding light, e.g. multicolour filters for photodetectors
• CPC Class Codes: H01L 31/02168 the coatings being antireflective or having enhancing optical properties for the solar cells
• CPC Class Codes: Y02E 10/50 Photovoltaic [PV] energy
• CPC Class Codes: Y10T 428/24174 including sheet or component perpendicular to plane of web or sheet

Abstract

Multi-layer antireflection coatings, devices including multi-layer antireflection coatings and methods of forming the same are disclosed. A block copolymer is applied to a substrate and self-assembled into parallel lamellae above a substrate. The block copolymer may optionally be allowed to self-assemble into a multitude of domains oriented either substantially parallel or substantially perpendicular to an underlying substrate.

Claims

1. A method of patterning a substrate, comprising:

allowing a block copolymer to self-assemble to form alternating layers of a block copolymer over a substrate, wherein each layer of the alternating layers includes a lamellae of a block of the block copolymer and each lamellae is oriented substantially parallel to a major plane of the substrate;

patterning a resist over the self-assembled block copolymer layer; and

exposing the substrate to a light source.

2. The method of claim 1, further comprising doping a first block of the block copolymer prior to allowing a block copolymer to self-assemble.

3. The method of claim 2, wherein doping a first block of the block copolymer comprises incorporating a dye or inorganic material into the first block of the block copolymer.

4. The method of claim 2, wherein doping a first block of the block copolymer comprises incorporating a water-insoluble photochromic dye into a hydrophobic core of the first block of the block copolymer.

5. The method of claim 2, wherein doping a first block of the block copolymer comprises incorporating a dopant selected from the group consisting of gold, platinum, cobalt, iron, palladium, nickel, copper, zinc, ruthenium, silver, rhodium, aluminum, chromium, manganese, yttrium and rhenium into the first block of the block copolymer.

6. The method of claim 1, further comprising cross-linking the self-assembled block copolymer layer prior to exposing the substrate to a light source.

7. The method of claim 1, wherein allowing a block copolymer to self-assemble comprises allowing the block copolymer to self-assemble to form at least three alternating layers of the block copolymer over the substrate.

8. A method of patterning a substrate, comprising:

forming a multilayer coating over a polymer mat and a substrate, the multilayer coating comprising self-assembled block copolymer domains including a plurality of zones of lamellae, each domain of the plurality of self-assembled block copolymer domains being above or below an adjacent self-assembled block copolymer domain;

patterning a resist over the multilayer coating; and

exposing the substrate to a light source.

9. The method of claim 8, wherein forming a multilayer coating comprises:

forming a block copolymer on the polymer mat; and

annealing the block copolymer.

10. The method of claim 8, wherein forming a multilayer coating comprises forming a multilayer coating including between 3 zones of lamellae and 20 zones of lamellae.

11. The method of claim 8, wherein forming a multilayer coating further comprises exposing the plurality of zones of lamellae to ultraviolet radiation.

12. The method of claim 8, wherein forming a multilayer coating comprises forming the self-assembled block copolymer domains including the plurality of zones of lamellae, each zone of the plurality of zones independently oriented substantially parallel or substantially perpendicular to a major plane of the substrate.

13. A method of patterning a substrate, comprising:

applying a block copolymer over a substrate;

annealing the block copolymer to form a self-assembled block copolymer including zones of lamellae, a first zone of lamellae proximate an air interface and a second zone of lamellae below the first zone of lamellae and proximate an interface with the substrate;

patterning a photoresist on an upper surface of the self-assembled block copolymer; and

exposing the substrate to radiation.

14. The method of claim 13, further comprising forming a polymer mat over the substrate.

15. The method of claim 14, further comprising cross-linking the polymer mat.

16. The method of claim 13, wherein applying a block copolymer over a substrate comprises applying a diblock copolymer over the substrate.

17. The method of claim 13, wherein applying a block copolymer over the substrate comprises applying more than one block selected from the group consisting of polybutadiene-polybutylmethacrylate, polybutadiene-polydimethylsiloxane, poly(styrene-b-methyl methacrylate) (PS-b-PMMA), polybutadiene-polymethylmethacrylate, polybutadiene-polyvinylpyridine, polybutylmethacrylate-polybutylacrylate, polybutylmethacrylate-polyvinylpyridine, polybutadiene-polyvinylpyridine, polyethyleneoxide-polyisoprene, polyethyleneoxide-polybutadiene, polyethyleneoxide-polystyrene, polyethylene-polyvinylpyridine, polyisoprene-polymethylmethacrylate, polyisoprene-polyvinylpyridine, polybutylacrylate-polymethylmethacrylate, polybutylacrylate-polyvinylpyridine, polyhexylacrylate-polyvinylpyridine, polyisobutylene-polybutylmethacrylate, polyisobutylene-polydimethoxysiloxane, polyisobutylene-polymethylmethacrylate, polyisobutylene-polyvinylpyridine, polyethylene-polymethylmethacrylate, polymethylmethacrylate-polybutylacrylate, polymethylmethacrylate-polybutylmethacrylate, polystyrene-polybutadiene, polystyrene-polybutylacrylate, polystyrene-polybutylmethacrylate, polystyrene-polybutylstyrene, polystyrene-polydimethoxysiloxane, polystyrene-polyvinylpyridine, polyvinylpyridine-polymethylmethacrylate, polystyrene-b-polyisoprene (PS-b-PI), polystyrene-b-lactic acid, and polyethyleneoxide-polymethylmethacrylate over the substrate.

18. The method of claim 13, wherein annealing the block copolymer comprises exposing the block copolymer to a temperature between about 0°

C. and about 250°

C.

19. The method of claim 13, further comprising exposing the zones of lamellae to ultraviolet radiation.

20. The method of claim 13, further comprising doping at least one block of the block copolymer before annealing the block copolymer.