Lithographic apparatus and device manufacturing method

• US 8,553,201 B2
• Filed: 10/01/2008
• Issued: 10/08/2013
• Est. Priority Date: 05/21/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Streefkerk, Bob, Cox, Henrikus Herman Marie, Hoogendam, Christiaan Alexander, Mertens, Jeroen Johannes Sophia Maria, Zaal, Koen Jacobus Johannes Maria, Cuperus, Minne
• Primary Examiner(s): Ton, Toan
• Assistant Examiner(s): RIDDLE, CHRISTINA A
• Application Number:
  US12/243,291
• Publication Number:
  US 20090033905A1
• Time in Patent Office: 1,833 Days
• Field of Search: 355/30, 355/53, 355/52, 355/55, 355 67- 73, 355/77, 430/5, 430/30, 430/311, 250/492.1, 250/492.2, 250/548
• US Class Current: 355/55
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70641 Focus
• CPC Class Codes: G03F 7/70783 Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight

Abstract

An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

Claims

1. A lithographic apparatus comprising:

a movable table;

a projection system arranged to project a patterned radiation beam onto a target portion of a radiation-sensitive substrate;

a liquid supply system member configured to contain a liquid in a space between the projection system and the substrate;

a liquid supply system member compensator arranged to compensate for a disturbance caused, or to be caused, to the table by a non-contact interaction between the liquid supply system member and the table, wherein the liquid supply system member compensator comprises a liquid supply system member suspension device capable of applying a force to the liquid supply system member to at least partially compensate for the interaction between the liquid supply system member and the table;

a liquid supply system member position determining device configured to determine a position of the liquid supply system member in a direction substantially perpendicular to the optical axis of the projection system; and

a liquid supply system member suspension device controller configured to apply a force to the liquid supply system member, via the liquid supply system member suspension device, based on a position of the liquid supply system member as measured by the liquid supply system member position determining device.

2. The lithographic apparatus according to claim 1, wherein the liquid supply system member suspension device is coupled to a frame supporting at least a part of the projection system, the frame being capable of supporting via the coupling at least part of the reaction to the force applied by the liquid supply system member suspension device to the liquid supply system member.

3. The lithographic apparatus according to claim 1, wherein the liquid supply system member suspension device is coupled to the projection system, the projection system being capable of supporting via the coupling at least part of the reaction to the force applied by the liquid supply system member suspension device to the liquid supply system member.

4. The lithographic apparatus according to claim 1, wherein the liquid supply system member suspension device controller is further configured to apply a control force to the liquid supply system member, via the liquid supply system member suspension device, according to data representing the magnitude of the interaction between the liquid supply system member and the table.

5. The lithographic apparatus according to claim 4, wherein the liquid supply system member suspension device controller is in communication with a liquid supply system member suspension device controller memory that is configured to store the data.

6. The lithographic apparatus according to claim 1, wherein the interaction comprises the weight of the liquid supply system member.

7. The lithographic apparatus according to claim 1, wherein the interaction comprises an external force.

8. The lithographic apparatus according to claim 1, wherein the liquid supply system member position determining device is further configured to determine a position of the liquid supply system member, relative to the projection system or a frame supporting at least a part of the projection system, in a direction substantially parallel to the optical axis of the projection system.

9. The lithographic apparatus according to claim 1, wherein the control force is applied so as to compensate for forces arising from a liquid supply system member guiding member attached between the liquid supply system member and a frame supporting at least a part of the projection system.

10. The lithographic apparatus according to claim 1, further comprising a table force compensator configured to determine the magnitude of the interaction between the liquid supply system member and the table and transmit data representing the magnitude to the liquid supply system member suspension device.

11. The lithographic apparatus according to claim 1, wherein the liquid supply system member suspension device operates by means of at least one mechanism selected from:

an electromagnetic force using the Lorentz principle, an electromagnetic force using the reluctance principle, a bellows, and/or a mechanical spring.

12. The lithographic apparatus according to claim 1, wherein the liquid supply system member suspension device is configured to support the liquid supply system member.

13. A lithographic apparatus comprising:

a movable table;

a projection system arranged to project a patterned radiation beam onto a target portion of a radiation-sensitive substrate;

a liquid supply system member configured to contain a liquid in a space between the projection system and the substrate; and

a liquid supply system member compensator arranged to compensate for a disturbance caused, or to be caused, by an interaction between the liquid supply system member and the table, wherein the interaction comprises an external position dependent force,

wherein the liquid supply system member compensator comprises a liquid supply system member suspension device capable of applying a force to the liquid supply system member to at least partially compensate for the interaction between the liquid supply system member and the table.

14. A lithographic apparatus comprising:

a movable table;

a projection system arranged to project a patterned radiation beam onto a target portion of a radiation-sensitive substrate;

a liquid supply system member configured to contain a liquid in a space between the projection system and the substrate; and

a liquid supply system member compensator arranged to compensate for a disturbance caused, or to be caused, to the table by a non-contact interaction between the liquid supply system member and the table, the liquid supply system member compensator comprising a liquid supply system member suspension device capable of applying a force to the liquid supply system member based on a position of the liquid supply system member in a substantially horizontal direction relative to a part of the lithographic apparatus to at least partially compensate for the interaction between the liquid supply system member and the table.

15. The lithographic apparatus according to claim 14, wherein the liquid supply system member compensator comprises a second sensor configured to measure the position of the liquid supply system member along a direction substantially perpendicular to the optical axis of the apparatus.

16. The lithographic apparatus according to claim 15, wherein the liquid supply system member compensator comprises a first sensor configured to measure the position of the liquid supply system member along an optical axis of the apparatus.

17. The lithographic apparatus according to claim 16, wherein the positions measured by the first and second sensors are provided to a controller to determine the force to be applied to the liquid supply system member.

18. The lithographic apparatus according to claim 16, wherein the first and second sensors are mounted to a frame of the projection system.

19. The lithographic apparatus according to claim 14, wherein the liquid supply system member suspension device is configured to support the liquid supply system member.

20. The lithographic apparatus according to claim 14, wherein the liquid supply system member suspension device controller is further configured to apply a force to the liquid supply system member, via the liquid supply system member suspension device, according to data representing the magnitude of the interaction between the liquid supply system member and the table.