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Lithographic apparatus and device manufacturing method

  • US 8,553,201 B2
  • Filed: 10/01/2008
  • Issued: 10/08/2013
  • Est. Priority Date: 05/21/2004
  • Status: Active Grant
First Claim
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1. A lithographic apparatus comprising:

  • a movable table;

    a projection system arranged to project a patterned radiation beam onto a target portion of a radiation-sensitive substrate;

    a liquid supply system member configured to contain a liquid in a space between the projection system and the substrate;

    a liquid supply system member compensator arranged to compensate for a disturbance caused, or to be caused, to the table by a non-contact interaction between the liquid supply system member and the table, wherein the liquid supply system member compensator comprises a liquid supply system member suspension device capable of applying a force to the liquid supply system member to at least partially compensate for the interaction between the liquid supply system member and the table;

    a liquid supply system member position determining device configured to determine a position of the liquid supply system member in a direction substantially perpendicular to the optical axis of the projection system; and

    a liquid supply system member suspension device controller configured to apply a force to the liquid supply system member, via the liquid supply system member suspension device, based on a position of the liquid supply system member as measured by the liquid supply system member position determining device.

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