Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus

• US 8,553,205 B2
• Filed: 06/24/2010
• Issued: 10/08/2013
• Est. Priority Date: 06/30/2009
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Roux, Stephen, Carter, Frederick Michael, Mackenzie, Ross Ian
• Primary Examiner(s): Kim, Peter B
• Assistant Examiner(s): Persaud, Deoram
• Application Number:
  US12/822,370
• Publication Number:
  US 20110149263A1
• Time in Patent Office: 1,202 Days
• Field of Search: 355/72, 318/687
• US Class Current: 355/72
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70758 Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
• CPC Class Codes: G05B 19/416 characterised by control of velocity, acceleration or deceleration G05B19/19 takes precedence
• CPC Class Codes: G05B 2219/42083 Position, speed and force feedback

Abstract

A control system controls a positioning device displaceable in at least one degree of freedom by a reluctance motor. A force sensing element and a controller adjust force applied by the motor responsive to a force sensing element configured to sense force applied by the motor. The controller receives a signal representing force applied by the motor from the force sensing element, obtain an acceleration trajectory plan associated with a velocity trajectory plan for the positioning device, obtain a force trajectory plan associated with the acceleration trajectory plan, compare the force applied with a required amount of force obtained from the force trajectory, and adjust the amount of force applied by the motor based on the comparison. Related methods are also presented.

Claims

1. A control system for controlling a positioning device displaceable in a degree of freedom via at least one reluctance motor, the control system comprising:

at least one force sensing element configured to sense an amount of force applied by a corresponding reluctance motor; and

a controller configured to;

apply a first adjustment to the amount of force applied by the corresponding reluctance motor based on output from a corresponding force sensing element, and

apply a second adjustment to adjust a size of a gap between a core and a flux carrying bar of the corresponding reluctance motor, wherein the second adjustment sets the size of the gap to a first distance in accordance with a first acceleration of the positioning device and sets the size of the gap to a second distance in accordance with a second acceleration of the positioning device.

2. The control system of claim 1, wherein the controller is configured to:

receive one or more control signals, including a signal representing the amount of force applied by the corresponding reluctance motor from the corresponding force sensing element;

obtain an acceleration trajectory plan associated with a velocity trajectory plan for the positioning device;

obtain a force trajectory plan associated with the acceleration trajectory plan;

compare the amount of force applied by the corresponding reluctance motor with a required amount of force obtained from the force trajectory plan; and

adjust the amount of force applied by the corresponding reluctance motor based on the comparison to obtain a desired force.

3. The control system of claim 2, wherein the controller is configured to adjust the amount of force by adjusting a current supplied to the corresponding reluctance motor.

4. The control system of claim 2, wherein the controller is further configured to:

repeat the receiving, obtaining an acceleration trajectory plan, obtaining a force trajectory plan, comparing, and adjusting as needed to maintain the desired force.

5. The control system of claim 1, wherein the control system and positioning device are part of a lithography apparatus.

6. The control system of claim 1, wherein the at least one force sensing element comprises at least one of a piezo ceramic and a strain gauge.

7. The control system of claim 1, further comprising a position control loop.

8. A lithography apparatus comprising:

an illumination system configured to condition a radiation beam;

a patterning device stage constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

a substrate stage constructed to hold a substrate;

a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and

a positioning system configured to control a position of a short stroke module configured to hold one of the substrate or the patterning device in at least a first degree of freedom, the positioning system including

a first motor assembly including one or more reluctance motors configured to move the short stroke module in the first degree of freedom;

a second motor assembly including one or more motors of a second type configured to move the short stroke module in the first degree of freedom; and

a control system for controlling at least the first motor assembly, the control system including;

at least one force sensing element configured to sense an amount of force applied by a corresponding reluctance motor; and

a controller configured to;

apply a first adjustment to the amount of force applied by the corresponding reluctance motor based on output from a corresponding force sensing element, and

apply a second adjustment to adjust a size of a gap between a core and a flux carrying bar of the corresponding reluctance motor,

wherein the second adjustment sets the size of the gap to a first distance in accordance with a first acceleration of the positioning system and sets the size of the gap to a second distance in accordance with a second acceleration of the positioning system.

9. The lithography apparatus of claim 8, wherein the controller is configured to adjust the amount of force by adjusting a current supplied to the corresponding reluctance motor.

10. The lithography apparatus of claim 8, wherein the control system further comprises a position control loop.

11. A method of positioning a movable object in a first degree of freedom, the method comprising:

providing a motor assembly including one or more reluctance motors configured to accelerate the movable object in the first degree of freedom;

providing at least one feedback signal representative of an amount of force applied by the motor assembly;

providing a first control signal to adjust the amount of force applied by the motor assembly based on the at least one feedback signal; and

providing a second control signal to adjust a size of a gap between a core and a flux carrying bar of a corresponding reluctance motor,

wherein the second adjustment sets the size of the gap to a first distance in accordance with a first acceleration of the movable object and sets the size of the gap to a second distance in accordance with a second acceleration of the movable object.

12. The method of claim 11, further comprising:

providing a controller configured to determine the first and second control signals.

13. The method of claim 11, wherein the controller determines the first control signal by:

obtaining an acceleration trajectory plan associated with a velocity trajectory plan for the object;

obtaining a force trajectory plan associated with the acceleration trajectory plan for the object;

comparing the amount of force applied by the motor assembly with a required amount of force obtained from the force trajectory plan; and

determining a force adjustment based on the comparison to be provided via the first control signal.

14. The method of claim 11, wherein the providing the first control signal includes providing at least one current adjustment signal to adjust an amount of current provided to at least one of the one or more reluctance motors.

15. A method of positioning a short stroke stage of a lithographic apparatus in a first degree of freedom, the method comprising:

providing a motor assembly including one or more reluctance motors configured to accelerate the short stroke stage in the first degree of freedom, each reluctance motor having a core coupled to a long stroke stage associated with the short stroke stage, a flux carrier bar coupled to the short stroke stage, and a gap between the core and the flux carrier bar;

providing a first adjustment to the acceleration applied by the corresponding reluctance motor; and

providing a second adjustment to adjust a size of the gap to minimize parasitic effects of a corresponding reluctance motor, wherein the second adjustment sets the size of the gap to a first distance in accordance with a first acceleration of the short stroke stage and sets the size of the gap to a second distance in accordance with a second acceleration of the short stroke stage.

16. The method of claim 15, wherein the providing a second adjustment to the size of the gap comprises:

adjusting the gap to a first size for high force acceleration of the short stroke stage in a first direction;

adjusting the gap to a second size for constant velocity of the short stroke stage; and

adjusting the gap to a third size for high force acceleration of the short stroke stage in a second direction.

17. A method of positioning a short stroke stage of a lithographic apparatus in a first degree of freedom, the method comprising:

accelerating the short stroke stage in a first direction with one or more reluctance motors at a first end of the short stroke stage and one or more additional motors of another type;

driving the short stroke stage at an approximately constant velocity in the first direction with the one or more additional motors;

accelerating the short stroke stage in a second direction opposite the first direction with one or more reluctance motors at a second end of the short stroke stage and the one or more additional motors;

driving the short stroke stage at an approximately constant velocity in the second direction with the one or more additional motors;

providing a first adjustment to respective amounts of force applied by the one or more reluctance motors at the first and second ends of the short stroke stage as needed based on output from one or more feedback sensors to sense an amount of force applied by a corresponding one of the one or more reluctance motors, and

providing a second adjustment to adjust a size of a gap between a core and a flux carrying bar of a corresponding reluctance motor to minimize parasitic effects of a corresponding reluctance motor, wherein the second adjustment sets the size of the gap to a first distance in accordance with the acceleration of the short stroke stage in the first direction and sets the size of the gap to a second distance in accordance with the acceleration of the short stroke stage in the second direction.