Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby

• US 8,560,979 B2
• Filed: 07/03/2012
• Issued: 10/15/2013
• Est. Priority Date: 12/30/2008
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Wong, William S., Liu, Fei, Chen, Been-Der, Lu, Yen-Wen
• Primary Examiner(s): Siek, Vuthe
• Assistant Examiner(s): Ngo, Brian
• Application Number:
  US13/541,638
• Publication Number:
  US 20120272196A1
• Time in Patent Office: 469 Days
• Field of Search: 716/50, 716/51, 716/53, 716/55
• US Class Current: 716/53
• CPC Class Codes: G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Abstract

A multivariable solver for proximity correction uses a Jacobian matrix to approximate effects of perturbations of segment locations in successive iterations of a design loop. The problem is formulated as a constrained minimization problem with box, linear equality, and linear inequality constraints. To improve computational efficiency, non-local interactions are ignored, which results in a sparse Jacobian matrix.

Claims

1. A method implemented by a computer for reducing optical proximity effect in a design layout to be included in a mask used in a lithographic process, the method comprising:

dividing patterns within the design layout into edge segments;

identifying a plurality of neighboring edge segments that interact with each other due to the optical proximity effect; and

computing, by using a computer, an amount of movement of each of the identified neighboring edge segments for reducing the optical proximity effect, the computing including maintaining a plurality of model values that can be used to predict a change in an image value associated with each of the identified neighboring edge segments given a correction amount of movement

wherein the optimal amount of movement is computed for the identified neighboring edge segments in terms of alteration of image values at predefined locations in the design layout;

wherein the plurality of model values are arranged in a matrix form, the matrix being used to compute the amount of movement; and

wherein the matrix comprises a sparse matrix, where matrix elements that represent effects of non-neighboring edge segments are assumed to be zero.

2. The method of claim 1, wherein the image value is a resist image value.

3. The method of claim 1, wherein the computed optimal amount of movement tracks an effect of collective movement of the identified neighboring edge segments.

4. The method of claim 1, wherein computing the movement amount for the edge segments in the design layout includes minimizing an objective function comprising the sparse matrix.

5. The method of claim 4, wherein the minimization is done in an iterative manner.

6. The method of claim 4, wherein the minimization is subject to one or more constraints.

7. The method of claim 6, wherein a maximum and a minimum value of the correction amount are used as constraints.

8. The method of claim 7, wherein one or more of the maximum and the minimum value of the correction amount are determined from mask design rules.

9. The method of claim 7, wherein one or more of the maximum and the minimum value of the correction amount are determined from user specification.

10. The method of claim 7, wherein one or more of the maximum and the minimum value of the correction amount are in the order of nanometers.

11. The method of claim 6, wherein a symmetry in the design layout is used as a constraint.

12. A method implemented by a computer for reducing optical proximity effect in a design layout to be included in a mask used in a lithographic process, the method comprising:

dividing patterns within the design layout into edge segments;

identifying a plurality of neighboring edge segments that interact with each other due to the optical proximity effect; and

computing, by using a computer, an amount of movement of each of the identified neighboring edge segments for reducing the optical proximity effect, wherein the computing considers a combined effect of collective movement of the identified neighboring edge segments on a value of a simulated image characteristic at one or more predefined locations in the design layout, the computing including maintaining a plurality of model values that can be used to predict a change in the value of the simulated image characteristic associated with each of the identified neighboring edge segments given a correction amount of movement

wherein the optimal amount of movement is computed for the identified neighboring edge segments in terms of alteration of image values at predefined locations in the design layout;

wherein the plurality of model values are arranged in a matrix form, the matrix being used to compute the amount of movement; and

wherein the matrix comprises a sparse matrix, where matrix elements that represent effects of non-neighboring edge segments are assumed to be zero.

13. The method of claim 12 wherein the simulated image characteristic is a resist image value.

14. The method of claim 12, wherein computing the movement amount for the edge segments in the design layout includes minimizing an objective function comprising the sparse matrix.

15. The method of claim 14, wherein the minimization is subject to one or more constraints.