Methods of forming patterns on substrates
First Claim
1. A method of forming a pattern on a substrate, comprising:
- forming spaced first features over a substrate, the spaced first features comprising opposing lateral sidewalls;
forming material onto the opposing lateral sidewalls of the spaced first features, that portion of the material received against at least one of the opposing lateral sidewalls being of different composition from composition of the at least one opposing lateral sidewall; and
densifying at least one of said portion of the material and the at least one opposing lateral sidewall of the spaced first features to move the at least one of said portion and the at least one opposing lateral sidewall laterally away from the other of the at least one of said portion and the at least one opposing lateral sidewall to form a void space between the at least one opposing lateral sidewall and said portion of the material.
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Accused Products
Abstract
A method of forming a pattern on a substrate includes forming spaced first features over a substrate. The spaced first features have opposing lateral sidewalls. Material is formed onto the opposing lateral sidewalls of the spaced first features. That portion of such material which is received against each of the opposing lateral sidewalls is of different composition from composition of each of the opposing lateral sidewalls. At least one of such portion of the material and the spaced first features is densified to move the at least one laterally away from the other of the at least one to form a void space between each of the opposing lateral sidewalls and such portion of the material.
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Citations
38 Claims
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1. A method of forming a pattern on a substrate, comprising:
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forming spaced first features over a substrate, the spaced first features comprising opposing lateral sidewalls; forming material onto the opposing lateral sidewalls of the spaced first features, that portion of the material received against at least one of the opposing lateral sidewalls being of different composition from composition of the at least one opposing lateral sidewall; and densifying at least one of said portion of the material and the at least one opposing lateral sidewall of the spaced first features to move the at least one of said portion and the at least one opposing lateral sidewall laterally away from the other of the at least one of said portion and the at least one opposing lateral sidewall to form a void space between the at least one opposing lateral sidewall and said portion of the material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A method of forming a pattern on a substrate, comprising:
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forming a feature over a substrate, the feature comprising at least one wall; forming material onto the wall of the feature, that portion of the material received against the wall being of different composition from composition of the wall; and densifying at least one of said portion of the material and the feature to move the at least one laterally away from the other of the at least one to form a void space between the wall and said portion of the material. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38)
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Specification