Processing condition determining method and apparatus, display method and apparatus, processing apparatus, measurement apparatus and exposure apparatus, substrate processing system, and program and information recording medium
First Claim
1. A processing condition determining method comprising:
- a determination process of determining, using an information processor, a processing condition for a pattern of a layer to be formed on an object during a lithography exposure process;
a measurement process of measuring at least one of occurrence frequency of overlay error and linewidth error between a target linewidth and a measured linewidth of a pattern that has been formed on the object according to the processing condition determined in the determination process; and
a process of obtaining frequency at which the determination process and the measurement process are performed, in accordance with the at least one of occurrence frequency of overlay error and linewidth error between a target linewidth and a measured linewidth of the pattern measured in the measurement process;
wherein the processing condition is determined based on information on a forming state of a pattern previously formed on at least one ofa plurality of layers that have been already formed on the object, anda plurality of layers that have already been formed on another object.
1 Assignment
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Accused Products
Abstract
In a first process, a process A, an actually measured transfer position measured by a measurement/inspection instrument is indicated by a black circle. A targeted transfer position indicated by x in a process B is located at the same position as the black circle. Assuming that the weights in the subsequent processes are the same, a targeted transfer position Xtarget indicated by x in processes C, D and E is located at a moderate position with which the total deviation from an actual transfer position (black circle) measured by the measurement/inspection instrument in a process preceding the current process is minimized, that is, at a proper position with respect to a plurality of other processes. Accordingly, the productivity of devices can be improved.
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Citations
36 Claims
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1. A processing condition determining method comprising:
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a determination process of determining, using an information processor, a processing condition for a pattern of a layer to be formed on an object during a lithography exposure process; a measurement process of measuring at least one of occurrence frequency of overlay error and linewidth error between a target linewidth and a measured linewidth of a pattern that has been formed on the object according to the processing condition determined in the determination process; and a process of obtaining frequency at which the determination process and the measurement process are performed, in accordance with the at least one of occurrence frequency of overlay error and linewidth error between a target linewidth and a measured linewidth of the pattern measured in the measurement process; wherein the processing condition is determined based on information on a forming state of a pattern previously formed on at least one of a plurality of layers that have been already formed on the object, and a plurality of layers that have already been formed on another object. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A substrate processing system comprising:
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a determination section that determines a processing condition of a pattern to be formed on an object during a lithography exposure process; a measurement section that measures at least one of occurrence frequency of overlay error and linewidth error between a target linewidth and a measured linewidth of a pattern that has been formed on the object according to the processing condition determined by the determination section; and a processing section that obtains frequency at which the determination section determines and the measurement section measures, in accordance with the at least one of occurrence frequency of overlay error and linewidth error between a target linewidth and a measured linewidth of the pattern measured by the measurement section; wherein the processing condition is determined based on information on a forming state of a pattern previously formed on at least one of a plurality of layers that have been already formed on the object, and a plurality of layers that have already been formed on another object.
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19. A non-transitory computer-readable medium storing thereon a program that, when executed by a computer, causes the computer to perform:
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a determination process of determining a processing condition for a pattern of a layer to be formed on an object during a lithography exposure process; a measurement process of measuring at least one of occurrence frequency of overlay error and linewidth error between a target linewidth and a measured linewidth of a pattern that has been formed on the object according to the processing condition determined in the determination process; and a process of obtaining frequency at which the determination process and the measurement process are performed, in accordance with the at least one of occurrence frequency of overlay error and linewidth error between a target linewidth and a measured linewidth of the pattern measured in the measurement process; wherein the processing condition is determined based on information on a forming state of a pattern previously formed on at least one of a plurality of layers that have been already formed on the object, and a plurality of layers that have already been formed on another object. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32)
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33. A method comprising:
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a determination process of determining, using an information processor, a processing condition for a pattern of a layer to be formed on an object during a lithography exposure process, the processing condition being determined based on information on a forming state of a pattern previously formed on at least one of a plurality of layers that have been already formed on the object, and a plurality of layers that have already been formed on another object; a measurement process of measuring at least one of overlay error and linewidth error of a pattern that has been formed on the object according to the processing condition determined in the determination process; a process of obtaining frequency at which the determination process and the measurement process are performed, in accordance with the at least one of overlay error and linewidth error measured in the measurement process; and a detection process of detecting, based on a comparison of a measurement result of the measurement process and a threshold value, at least one of overlay abnormality and linewidth abnormality of a pattern of the layer that is subject to processing; wherein the determination process is performed only in the case where said at least one of overlay abnormality and linewidth abnormality has been detected by the detection process. - View Dependent Claims (34, 35)
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36. A non-transitory computer readable medium storing thereon a computer program that, when executed by a computer, causes the computer to perform:
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a determination process of determining, using an information processor, a processing condition for a pattern of a layer to be formed on an object during a lithography exposure process, the processing condition being determined based on information on a forming state of a pattern previously formed on at least one of a plurality of layers that have been already formed on the object, and a plurality of layers that have already been formed on another object; a measurement process of measuring at least one of overlay error and linewidth error of a pattern that has been formed on the object according to the processing condition determined in the determination process; a process of obtaining frequency at which the determination process and the measurement process are performed, in accordance with the at least one of overlay error and linewidth error measured in the measurement process; and a detection process of detecting, based on a comparison of a measurement result of the measurement process and a threshold value, at least one of overlay abnormality and linewidth abnormality of a pattern of the layer that is subject to processing; wherein the determination process is performed only in the case where said at least one of overlay abnormality and linewidth abnormality has been detected by the detection process.
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Specification