Porous and non-porous nanostructures
First Claim
1. A method of making a porous nanowire or nanowire-like structure comprising:
- obtaining an etchable substrate;
performing metal-assisted electroless etch comprising the steps of;
(i) forming on a surface of the substrate a patterned porosification assisting metal layer that has at least one opening, wherein said opening has at least one lateral dimension of no more than 5 microns; and
(ii) exposing the substrate to an etching solution, wherein said etching solution dissolves the patterned porosification assisting layer to form a metal containing etching solution, andwherein the metal containing etching solution etches a first portion of the substrate to form an elongated structure, and porosifies a portion of the elongated structure to form a nanoporous nanowire or nanowire-like structure having a cross-section determined by the opening, wherein the cross-section is substantially perpendicular to the axis, the cross-section has at least one lateral dimension of no more than 5 microns, and said porous nanowire or nanowire-like structure has an aspect ratio no less than 4.
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Abstract
Disclosed are a variety of porous and non-porous wire-like structures of microscopic and nanoscopic scale. For instance, disclosed are structures that comprise a porous object that comprises: (i) a first region; and (ii) a second region adjacent to the first region along an axis of the object, where the first region has at least one porous property different from that of the second region. Also disclosed are structures that include: (i) a high resistivity silicon; and (ii) a cross-section that is substantially perpendicular to an axis of the object. Also disclosed are methods of making and using such structures. For instance, the present invention provides methods of making a porous object by: (i) obtaining an etchable substrate; (ii) forming on a surface of the substrate a patterned porosification assisting metal layer that has at least one opening; and (iii) subsequently exposing the substrate to a first etching solution and a second etching solution to form respectively a first region and a second region of a porous object.
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Citations
70 Claims
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1. A method of making a porous nanowire or nanowire-like structure comprising:
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obtaining an etchable substrate; performing metal-assisted electroless etch comprising the steps of; (i) forming on a surface of the substrate a patterned porosification assisting metal layer that has at least one opening, wherein said opening has at least one lateral dimension of no more than 5 microns; and (ii) exposing the substrate to an etching solution, wherein said etching solution dissolves the patterned porosification assisting layer to form a metal containing etching solution, and wherein the metal containing etching solution etches a first portion of the substrate to form an elongated structure, and porosifies a portion of the elongated structure to form a nanoporous nanowire or nanowire-like structure having a cross-section determined by the opening, wherein the cross-section is substantially perpendicular to the axis, the cross-section has at least one lateral dimension of no more than 5 microns, and said porous nanowire or nanowire-like structure has an aspect ratio no less than 4. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
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35. A method of forming a porous nanowire or nanowire-like structure, comprising:
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obtaining an etchable semiconductor substrate; performing metal-assisted electroless etch comprising the steps of; (i) forming on a surface of the substrate a patterned porosification assisting metal layer that has at least one opening, wherein said opening has at least one lateral dimension of no more than 5 microns; and (ii) subsequently exposing the substrate to a first etching solution and a second etching solution to form respectively a first region and a second region of a porous nanowire or nanowire-like structure, wherein said exposing results in dissolving the etch assisting metal in at least one of the first and second etching solutions to form a metal containing etching solution, wherein the metal containing etching solution porosifies a portion of the substrate to form a first porous region having a cross-section determined by the opening, wherein the cross-section is substantially perpendicular to the axis, the cross-section has at least one lateral dimension of no more than 5 microns, and wherein said second region is adjacent to the first region along an axis of the nanowire or nanowire-like structure and has at least one porous property different from that of the first region, wherein said property is selected from the group consisting of a pore size, porosity and pore orientation. - View Dependent Claims (36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49)
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50. A method of making a porous object comprising:
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(i) obtaining a silicon substrate having a resistance higher than 0.02 Ω
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cm;(ii) depositing a porosification assisting metal on a surface of the substrate; and (iii) subsequently exposing the substrate to an etching solution, wherein the etching solution comprises HF and an oxidant, and wherein the HF and the oxidant are at concentration levels effective to form a porous object. - View Dependent Claims (51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61)
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62. A method of making a nanowire or nanowire-like structure comprising:
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(i) obtaining a non-porous object that has a cross-section that is substantially perpendicular to an axis of the object, wherein said cross-section has at least one lateral dimension of no more than 5 microns, and wherein an aspect ratio of said object is at least 4; and (ii) forming a nanowire or nanowire-like structure from the non-porous object by metal-assisted electroless etch, wherein the forming step comprises; depositing a porosification assisting metal on a surface of the non-porous object; and exposing the non-porous object to an etching solution that dissolves the etch-assisting metal to form a metal containing solution that etches away a portion of the non-porous object to form a non-porous elongated structure, wherein the porosifying solution comprises; an effective concentration of HF, an oxidizer, and at least one of ions and atoms of a porosification assisting metal. - View Dependent Claims (63)
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64. A method of making a multi-doped structure comprising:
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obtaining a semiconductor substrate that comprises a first doping region and a second doping region, wherein the second doping region is different from the first doping region in at least one of a dopant type and a dopant concentration; and performing metal-assisted electroless etch comprising the steps of; (i) depositing an etching assisting metal on a surface of the substrate and exposing the substrate to an etching solution, wherein the etching solution dissolves the etching assisting metal to form a metal containing etching solution, wherein the metal containing etching solution etches away a portion of the substrate to form a multi-doped structure that has a cross-section that is substantially perpendicular to an axis of the structure, wherein said cross-section has at least one lateral dimension of no more than 5 microns and an aspect ratio of at least 4, and wherein said structure comprises a first doping region formed from the first doping region of the substrate and a second doping region formed from the second doping region of the substrate. - View Dependent Claims (65, 66, 67, 68, 69, 70)
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Specification