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Manufacturing method for a rotation sensor device and rotation sensor device

  • US 8,573,054 B2
  • Filed: 09/02/2009
  • Issued: 11/05/2013
  • Est. Priority Date: 09/02/2008
  • Status: Active Grant
First Claim
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1. A manufacturing method for a rotation sensor device having a holding device, an oscillating mass, and at least one spring, via which the oscillating mass is connected to the holding device, the at least one spring being designed in such a way that the oscillating mass can be set into an oscillating movement around an oscillation axis with respect to the holding device with the aid of a drive, comprising the following steps:

  • producing a layer sequence having a first layer made of a semiconductor material and/or a metal and a second layer made of a semiconductor material and/or a metal, a boundary surface of the first layer, which faces toward the second layer, being at least partially covered by an insulating layer;

    structuring the at least one spring out of the first layer; and

    structuring at least one oscillating mass subunit of the oscillating mass, which can be set into the oscillating movement around the oscillation axis with the aid of the drive, out of the second layer;

    wherein the first layer having a first layer thickness and the second layer having a second layer thickness, which is unequal to the first layer thickness, are formed;

    wherein the first layer and the second layer are formed in such a way that the second layer thickness is greater than the first layer thickness by a factor of at least 5; and

    wherein at least one electrode is fixedly connected to the oscillating mass and is structured out of the second layer.

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