Reactive sputtering chamber with gas distribution tubes
First Claim
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1. A Plasma Vapor Deposition apparatus for depositing a layer on a substrate, comprising:
- a vacuum chamber;
a substrate support positioned in the vacuum chamber; and
a plurality of gas introduction tubes extending across an internal volume of the vacuum chamber, the gas introduction tubes comprising;
a first inner tube having a plurality of first openings extending along a first center axis, the first openings occupying a first plurality of different angular positions on a circumference of the first inner tube, wherein the first plurality of different angular positions are defined with respect to the first center axis that extends along a flow direction of the first inner tube;
an outer tube surrounding the first inner tube and having a plurality of second openings extending along the first center axis which do not align with the first openings, the second openings occupying a second plurality of different angular positions on a circumference of the outer tube, wherein the second plurality of different angular positions are defined with respect to the first center axis; and
a second inner tube having a plurality of third openings extending along the first center axis which do not align with the first openings, the first inner tube surrounding the second inner tube.
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Abstract
A sputtering apparatus for processing large area substrates is provided. By introducing gas across the entire target surface, a uniform composition film may be formed on the substrate. When the gas is introduced merely at the perimeter, the gas distribution is not uniform. By providing a gas introduction tube across the processing area, the reactive gas will uniformly distribute to the whole target. Also, providing the gas tube with multiple inner tubes provides a quick, effective gas dispersion capability.
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Citations
6 Claims
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1. A Plasma Vapor Deposition apparatus for depositing a layer on a substrate, comprising:
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a vacuum chamber; a substrate support positioned in the vacuum chamber; and a plurality of gas introduction tubes extending across an internal volume of the vacuum chamber, the gas introduction tubes comprising; a first inner tube having a plurality of first openings extending along a first center axis, the first openings occupying a first plurality of different angular positions on a circumference of the first inner tube, wherein the first plurality of different angular positions are defined with respect to the first center axis that extends along a flow direction of the first inner tube; an outer tube surrounding the first inner tube and having a plurality of second openings extending along the first center axis which do not align with the first openings, the second openings occupying a second plurality of different angular positions on a circumference of the outer tube, wherein the second plurality of different angular positions are defined with respect to the first center axis; and a second inner tube having a plurality of third openings extending along the first center axis which do not align with the first openings, the first inner tube surrounding the second inner tube. - View Dependent Claims (2, 3, 4, 5)
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6. A Plasma Vapor Deposition apparatus for depositing a layer on a substrate, comprising:
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a vacuum chamber; a substrate support positioned in the vacuum chamber; and a plurality of gas introduction tubes extending across an internal volume of the vacuum chamber, the gas introduction tubes comprising; a first inner tube having a plurality of first openings extending along a first center axis, the first openings occupying four different angular positions on a circumference of the first inner tube, wherein the first angular positions are defined with respect to the first center axis that extends along a flow direction of the first inner tube; an outer tube surrounding the first inner tube and having a plurality of second openings extending along the first center axis which do not align with the first openings, the second openings occupying four different angular positions on a circumference of the outer tube, wherein the second plurality of different angular positions are defined with respect to the first center axis; and a second inner tube having a plurality of third openings extending along the first center axis which do not align with the first openings, the first inner tube surrounding the second inner tube.
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Specification