Deposition method and manufacturing method of light-emitting device
First Claim
1. A deposition method comprising the steps of:
- forming a plurality of light absorption layers over a first surface of a first substrate;
forming a material layer over the first surface of the first substrate so that the material layer covers the plurality of the light absorption layers;
making the first surface of the first substrate and a deposition target surface of a second substrate face each other; and
irradiating opposite to the first surface of the first substrate with a laser, whereby apart of the material layer is deposited on the deposition target surface of the second substrate,wherein the part of the material layer overlaps and is in direct contact with the plurality of the light absorption layers,wherein the part of the material layer is selectively heated by irradiating with the laser through the plurality of the light absorption layers, andwherein different thicknesses of the material layer is deposited on the deposition target surface of the second substrate in one deposition step, without changing an intensity of the laser, by controlling each thickness of the plurality of light absorption layers.
1 Assignment
0 Petitions
Accused Products
Abstract
Part of a material layer is deposited on a deposition target surface of a second substrate by steps of providing a first substrate having a light absorption layer and a material layer in contact with the light absorption layer over one of surfaces; making a surface of the first substrate over which the material layer is formed and a deposition target surface of a second substrate face to each other; depositing part of the material layer on the deposition target surface of the second substrate in such a manner that irradiation with laser light of which repetition rate is greater than or equal to 10 MHz and pulse width is greater than or equal to 100 fs and less than or equal to 10 ns is performed from the other surface side of the first substrate to selectively heat part of the material layer overlapping with the light absorption layer.
73 Citations
32 Claims
-
1. A deposition method comprising the steps of:
-
forming a plurality of light absorption layers over a first surface of a first substrate; forming a material layer over the first surface of the first substrate so that the material layer covers the plurality of the light absorption layers; making the first surface of the first substrate and a deposition target surface of a second substrate face each other; and irradiating opposite to the first surface of the first substrate with a laser, whereby apart of the material layer is deposited on the deposition target surface of the second substrate, wherein the part of the material layer overlaps and is in direct contact with the plurality of the light absorption layers, wherein the part of the material layer is selectively heated by irradiating with the laser through the plurality of the light absorption layers, and wherein different thicknesses of the material layer is deposited on the deposition target surface of the second substrate in one deposition step, without changing an intensity of the laser, by controlling each thickness of the plurality of light absorption layers. - View Dependent Claims (2, 3, 4, 5, 6)
-
-
7. A deposition method comprising the steps of:
-
forming a light absorption layer over a first surface of a first substrate; forming a material layer over the first surface of the first substrate so that the material layer covers the light absorption layer; making the first surface of the first substrate and a deposition target surface of a second substrate face each other; and irradiating opposite to the first surface of the first substrate with a laser, whereby a part of the material layer is deposited on the deposition target surface of the second substrate, wherein the part of the material layer overlaps and is in direct contact with the light absorption layer, wherein the part of the material layer is selectively heated by irradiating with the laser through the light absorption layer, and wherein different thicknesses of the material layer is deposited on the deposition target surface of the second substrate in one deposition step, without changing an intensity of the laser, by controlling thicknesses of the light absorption layer. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14)
-
-
15. A method for manufacturing a light-emitting device comprising the steps of:
-
forming a plurality of light absorption layers over a first surface of a first substrate; forming a material layer over the first surface of the first substrate so that the material layer covers the plurality of the light absorption layers; forming an electrode over a second substrate; making the first surface of the first substrate and a deposition target surface of the second substrate on the electrode face each other; and irradiating opposite to the first surface of the first substrate with a laser, whereby a part of the material layer is deposited on the deposition target surface of the second substrate, wherein the part of the material layer overlaps and is in direct contact with the plurality of the light absorption layers, wherein the part of the material layer is selectively heated by irradiating with the laser through the plurality of the light absorption layers, and wherein different thicknesses of the material layer is deposited on the deposition target surface of the second substrate in one deposition step, without changing an intensity of the laser, by controlling each thickness of the plurality of light absorption layers. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22)
-
-
23. A method for manufacturing a light-emitting device comprising the steps of:
-
forming a light absorption layer over a first surface of a first substrate; forming a material layer over the first surface of the first substrate so that the material layer covers the light absorption layer; forming an electrode over a second substrate; making the first surface of the first substrate and a deposition target surface of the second substrate on the electrode face each other; and irradiating opposite to the first surface of the first substrate with a laser, whereby a part of the material layer is deposited on the deposition target surface of the second substrate, wherein the part of the material layer overlaps and is in direct contact with the light absorption layer, wherein the part of the material layer is selectively by irradiating with the laser through the light absorption layer, and wherein different thicknesses of the material layer is deposited on the deposition target surface of the second substrate in one deposition step, without changing an intensity of the laser, by controlling thicknesses of the light absorption layer. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30, 31, 32)
-
Specification