Effective light source shape database generation method, optical image calculation method, recording medium, exposure method, and device fabrication method
First Claim
1. In an exposure apparatus including an illumination optical system which illuminates an original with light from a light source, and a projection optical system which projects a pattern of the original onto a substrate, a method of generating a database of effective light source distributions formed in the illumination optical system, the method comprising:
- a generation step of calculating effective light source distributions while changing a plurality of conditions settable for the illumination optical system, and generating an initial database including the calculated effective light source distributions corresponding to the plurality of conditions;
a measurement step of setting a first condition of the plurality of conditions for the illumination optical system, and measuring an effective light source distribution corresponding to the first condition;
a calculation step of calculating, based on a difference amount between the measured effective light source distribution, and the calculated effective light source distribution corresponding to the first condition included in the initial database, a difference function representing difference amounts of the calculated effective light source distributions corresponding to conditions different from the first condition included in the initial database, the difference function being a function of a condition settable for the illumination optical system; and
a correction step of correcting the calculated effective light source distribution corresponding to each of the plurality of conditions including the conditions different from the first condition included in the initial database using the difference function, and compiling the corrected effective light source distribution into an actual database.
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Abstract
The present invention provides a method of generating a database of effective light source shapes including a generation step of generating an initial database representing an effective light source shapes corresponding to a plurality of conditions settable for an illumination optical system, a measurement step of setting an arbitrary condition for the illumination optical system, and measuring an effective light source shape, a calculation step of calculating a difference amount between an effective light source shape when each of the plurality of conditions is set for the illumination optical system and the effective light source shape included in the initial database, and a correction step of correcting the effective light source shapes included in the initial database using the difference amounts and compiling the corrected effective light source shapes into an actual database.
13 Citations
11 Claims
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1. In an exposure apparatus including an illumination optical system which illuminates an original with light from a light source, and a projection optical system which projects a pattern of the original onto a substrate, a method of generating a database of effective light source distributions formed in the illumination optical system, the method comprising:
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a generation step of calculating effective light source distributions while changing a plurality of conditions settable for the illumination optical system, and generating an initial database including the calculated effective light source distributions corresponding to the plurality of conditions; a measurement step of setting a first condition of the plurality of conditions for the illumination optical system, and measuring an effective light source distribution corresponding to the first condition; a calculation step of calculating, based on a difference amount between the measured effective light source distribution, and the calculated effective light source distribution corresponding to the first condition included in the initial database, a difference function representing difference amounts of the calculated effective light source distributions corresponding to conditions different from the first condition included in the initial database, the difference function being a function of a condition settable for the illumination optical system; and a correction step of correcting the calculated effective light source distribution corresponding to each of the plurality of conditions including the conditions different from the first condition included in the initial database using the difference function, and compiling the corrected effective light source distribution into an actual database. - View Dependent Claims (2, 3, 9, 10, 11)
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4. Of a first exposure apparatus and a second exposure apparatus each including an illumination optical system which illuminates an original with light from a light source, and a projection optical system which projects a pattern of the original onto a substrate, a method of generating a database of effective light source distributions formed in the illumination optical system of the second exposure apparatus, the method comprising:
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an obtaining step of obtaining, as an initial database, a database including effective light source distributions corresponding to a plurality of conditions settable for the illumination optical system of the first exposure apparatus; a measurement step of setting, for the illumination optical system of the second exposure apparatus, a first condition of the plurality of conditions settable for the illumination optical system of the second exposure apparatus, and measuring an effective light source distribution corresponding to the first condition; a calculation step of calculating, based on a difference amount between the measured effective light source distribution, and the obtained effective light source distribution corresponding to the first condition included in the initial database, a difference function representing difference amounts of the obtained effective light source distributions corresponding to conditions different from the first condition included in the initial database, the difference function being a function of a condition settable for the illumination optical system of the second exposure apparatus; and a correction step of correcting the obtained effective light source distribution corresponding to each of the plurality of conditions including the conditions different from the first condition included in the initial database using the difference function, and compiling the corrected effective light source distribution into an actual database.
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5. A method of calculating an optical image formed on an image plane of a projection optical system in an exposure apparatus including an illumination optical system which illuminates an original with light from a light source, and the projection optical system which projects a pattern of the original onto the substrate, the method comprising:
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a database generation step of generating a database of effective light source distributions formed in the illumination optical system; and a calculation step of receiving, as input information, the effective light source distributions included in the database generated in the database generation step, the pattern of the original, and information concerning the projection optical system, and calculating an optical image formed on the image plane of the projection optical system based on the input information, the database generation step including; a generation step of calculating effective light source distributions while changing a plurality of conditions settable for the illumination optical system, and generating an initial database including the calculated effective light source distributions corresponding to the plurality of conditions, a measurement step of setting a first condition of the plurality of conditions for the illumination optical system, and measuring an effective light source distribution corresponding to the first condition, a calculation step of calculating, based on a difference amount between the measured effective light source distribution, and the calculated effective light source distribution corresponding to the first condition included in the initial database, a difference function representing difference amounts of the calculated effective light source distributions corresponding to conditions different from the first condition included in the initial database, the difference function being a function of a condition settable for the illumination optical system, and a correction step of correcting the calculated effective light source distribution corresponding to each of the plurality of conditions including the conditions different from the first condition included in the initial database using the difference function, and compiling the corrected effective light source distribution into an actual database.
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6. A non-transitory recording medium recording a program for making a computer calculate an optical image formed on an image plane of a projection optical in an exposure apparatus including an illumination optical system which illuminates an original with light from a light source, and the projection optical system which projects a pattern of the original onto the substrate, the program making the computer execute:
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a database generation step of generating a database of effective light source distributions formed in the illumination optical system; and a calculation step of receiving, as input information, the effective light source distributions included in the database generated in the database generation step, the pattern of the original, and information concerning the projection optical system, and calculating an optical image formed on the image plane of the projection optical system based on the input information, wherein the database generation step includes; a generation step of calculating effective light source distributions while changing a plurality of conditions settable for the illumination optical system, and generating an initial database including the calculated effective light source distributions corresponding to the plurality of conditions, a measurement step of setting a first condition of the plurality of conditions for the illumination optical system, and measuring an effective light source distribution corresponding to the first condition, a calculation step of calculating, based on a difference amount between the measured effective light source distribution, and the calculated effective light source distribution corresponding to the first condition included in the initial database, a difference function representing difference amounts of the calculated effective light source distributions corresponding to conditions different from the first condition included in the initial database, the difference function being a function of a condition settable for the illumination optical system, and a correction step of correcting the calculated effective light source distribution corresponding to each of the plurality of conditions including the conditions different from the first condition included in the initial database using the difference function, and compiling the corrected effective light source distribution into an actual database.
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7. An exposure method for an exposure apparatus including an illumination optical system which illuminates an original with light from a light source, and a projection optical system which projects a pattern of the original onto a substrate, the method comprising:
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a database generation step of generating a database of effective light source distributions formed in the illumination optical system; a calculation step of receiving, as input information, the effective light source distributions included in the database generated in the database generation step, the pattern of the original, and information concerning the projection optical system, and calculating an optical image formed on an image plane of the projection optical system based on the input information; a setting step of setting an exposure condition of the exposure apparatus based on evaluation of the optical image calculated in the calculation step; an illumination step of illuminating the original under the exposure condition set in the setting step; and a projection step of projecting an image of the pattern of the original illuminated in the illumination step onto the substrate via the projection optical system, wherein the database generation step includes; a generation step of calculating effective light source distributions while changing a plurality of conditions settable for the illumination optical system, and generating an initial database including the calculated effective light source distributions corresponding to the plurality of conditions, a measurement step of setting a first condition of the plurality of conditions for the illumination optical system, and measuring an effective light source distribution corresponding to the first condition, a calculation step of calculating, based on a difference amount between the measured effective light source distribution, and the calculated effective light source distribution corresponding to the first condition included in the initial database, a difference function representing difference amounts of the calculated effective light source distributions corresponding to conditions different from the first condition included in the initial database, the difference function being a function of a condition settable for the illumination optical system, and a correction step of correcting the calculated effective light source distribution corresponding to each of the plurality of conditions including the conditions different from the first condition included in the initial database using the difference function, and compiling the corrected effective light source distribution into an actual database. - View Dependent Claims (8)
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Specification