Light emitting device and method of fabricating a light emitting device
First Claim
1. A light emitting device, comprising:
- a carrier substrate;
at least one epitaxy structure, disposed on the carrier substrate, and comprising a first semiconductor layer, an active layer, and a second semiconductor layer stacked in sequence, wherein the first semiconductor layer is relatively away from the carrier substrate and the second semiconductor layer is relatively close to the carrier substrate;
a high resistant ring wall, surrounding the epitaxy structure, wherein a width of the high resistant ring wall is greater than 5 μ
m and the high resistant ring wall is in contact with the first semiconductor layer, the active layer and the second semiconductor layer;
a first electrode, disposed between the carrier substrate and the epitaxy structure; and
a second electrode, disposed at a side of the epitaxy structure away from the carrier substrate.
1 Assignment
0 Petitions
Accused Products
Abstract
A light emitting device and a method of fabricating a light emitting device are provided. The light emitting device includes a carrier substrate, at least one epitaxy structure, a high resistant ring wall, a first electrode, and a second electrode. The epitaxy structure is disposed on the carrier substrate and includes a first semiconductor layer, an active layer, and a second semiconductor layer stacked in sequence. The first semiconductor layer is relatively away from the carrier substrate and the second semiconductor layer is relatively close to the carrier substrate. The high resistant ring wall surrounds the epitaxy structure and a width of the high resistant ring wall is greater than 5 μm. The first electrode is disposed between the carrier substrate and the epitaxy structure. The second electrode is disposed at a side of the epitaxy structure away from the carrier substrate.
-
Citations
9 Claims
-
1. A light emitting device, comprising:
-
a carrier substrate; at least one epitaxy structure, disposed on the carrier substrate, and comprising a first semiconductor layer, an active layer, and a second semiconductor layer stacked in sequence, wherein the first semiconductor layer is relatively away from the carrier substrate and the second semiconductor layer is relatively close to the carrier substrate; a high resistant ring wall, surrounding the epitaxy structure, wherein a width of the high resistant ring wall is greater than 5 μ
m and the high resistant ring wall is in contact with the first semiconductor layer, the active layer and the second semiconductor layer;a first electrode, disposed between the carrier substrate and the epitaxy structure; and a second electrode, disposed at a side of the epitaxy structure away from the carrier substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
-
Specification