Interspinous process implant having a thread-shaped wing and method of implantation

• US 8,591,546 B2
• Filed: 12/07/2011
• Issued: 11/26/2013
• Est. Priority Date: 03/21/2005
• Status: Active Grant

• Current Assignee: Warsaw Orthopedic Incorporated (Medtronic Plc)
• Original Assignee: Warsaw Orthopedic Incorporated (Medtronic Plc)
• Inventors: Zucherman, James F., Hsu, Ken Y., Winslow, Charles J., Mitchell, Steven T., Yerby, Scott A., Markwart, John A., Flynn, John J.
• Primary Examiner(s): LAWSON, MATTHEW JAMES
• Application Number:
  US13/313,391
• Publication Number:
  US 20120083843A1
• Time in Patent Office: 720 Days
• Field of Search: 606248-251, 623 1711- 1716
• US Class Current: 606/248
• CPC Class Codes: A61B 17/1757 for the spine
• CPC Class Codes: A61B 17/7062 Devices acting on, attached to, or simulating the effect of, vertebral processes, vertebral facets or ribs rib fixation devices A61B17/8076; Tools for such devices
• CPC Class Codes: A61B 17/7068 Devices comprising separate rigid parts, assembled in situ, to bear on each side of spinous processes; Tools therefor

Abstract

A spinal implant adapted to be inserted into an interspinous space between adjacent spinous processes includes a proximal section, a central section, and a distal section disposed sequentially along a longitudinal axis. The distal section has feature(s) that allow the implant to be inserted laterally into the interspinous space, such as an approximately helical groove and/or a thread-like structure. The distal tip of the implant tapers inwardly, and may be rounded. The proximal section may include an outwardly extending wing or flange. The implant may include a main body that includes the wing or flange and a spacer slidably mated to the main body through the wing or flange.

Claims

1. A spinal implant adapted to be inserted into an interspinous space between adjacent spinous processes, comprising:

a proximal section, a central section, and a distal section disposed sequentially along a longitudinal axis, the central section includes a top section and a bottom section;

the distal section having a thread-like structure spiraling about a portion of the distal section such that the top section of the central portion is non-threaded a distance shorter than the bottom section of the central portion, the thread-like structure defining an outermost portion thereof relative to the longitudinal axis, such that the outermost portion is configured to engage the spinous process to limit movement of the implant;

the distal section terminating in a distal tip disposed distally of the thread-like structure and defining a distal-most portion of the implant;

the distal tip tapering inward in a distal direction;

the central section sized and configured to engage the adjacent spinous processes when the implant is disposed through the interspinous space between the adjacent spinous processes; and

the proximal section having a wing that extends farther outward relative to the longitudinal axis than all portions of the central section.

2. The implant of claim 1 wherein the distal tip is rounded.

3. The implant of claim 1 wherein the distal section includes a first portion movable between an expanded configuration and a collapsed configuration;

the first portion disposed proximally of the distal tip.

4. The implant of claim 1 wherein the implant comprises Nitinol and a biocompatible polymer.

5. The implant of claim 4 wherein the biocompatible polymer is PEEK.

6. The implant of claim 1 wherein the thread-like structure extends a constant distance from the longitudinal axis.

7. The implant of claim 1 wherein the thread-like structure is helical.

8. The implant of claim 1 wherein the implant includes a longitudinally extending cavity.

9. The implant of claim 1 wherein the implant comprises a main body that includes the wing and a spacer slidably mated to the main body through the wing.

10. The implant of claim 9, wherein the spacer includes a top portion and a bottom portion being longer than the top portion such that the bottom portion of the spacer fits into the non-threaded bottom section of the central portion and the top portion fits into the non-threaded top section of the central portion.

11. The implant of claim 1 wherein the thread-like structure is adapted to guide the implant between the spinous processes so that the implant is selectively disposed through the interspinous space.

12. A spinal implant adapted to be inserted into an interspinous space between adjacent spinous processes, comprising:

a proximal section, a central section, and a distal section disposed sequentially along a longitudinal axis, the central section includes a top section and a bottom section;

the distal section having an external helical groove spiraling about a portion of the distal section such that the top section of the central portion includes a flat surface shorter than a flat surface of the bottom section of the central portion;

the distal section terminating in a distal tip disposed distally of the groove and defining a distal-most portion of the implant;

the distal tip tapering inward in a distal direction;

the proximal section having a flange that extends farther outward relative to the longitudinal axis than all portions of the central section;

wherein the flange is sized and configured to limit distal displacement of the implant when the implant is disposed through the interspinous space between the adjacent spinous processes;

wherein the distal section includes a first portion movable between an expanded configuration and a collapsed configuration;

the first portion disposed proximally of the distal tip;

wherein the first portion, in the expanded configuration, is sized and configured to limit proximal displacement of the implant when the implant is disposed through the interspinous space between the adjacent spinous processes; and

wherein the distal section, when the first portion is in the expanded configuration, extends farther outward from the longitudinal axis than all portions of the central section.

13. The implant of claim 12 wherein the distal tip is rounded.

14. The implant of claim 12 wherein the groove has a constant depth.

15. The implant of claim 12 wherein the implant includes a longitudinally extending cavity.

16. The implant of claim 12 wherein the implant comprises a main body that includes the flange and a spacer slidably mated to the main body through the flange.

17. The implant of claim 16, wherein the spacer includes a top portion and a bottom portion being longer than the top portion of the spacer such that the bottom portion of the spacer fits into the flat surface of the bottom section of the central section and the top portion fits into the flat surface of the top section of the central section.

18. The implant of claim 12 wherein a portion of the distal section disposed proximal to the distal tip, and comprising the groove, is adapted to guide the implant between the spinous processes so that the implant is selectively disposed through the interspinous space.

19. A spinal implant adapted to be inserted into an interspinous space between adjacent spinous processes, comprising:

a proximal section, a central section, a main body and a distal section disposed sequentially along a longitudinal axis;

the distal section having a thread-like structure defining an outermost portion thereof relative to the longitudinal axis;

the distal section terminating in a distal tip disposed distally of the thread-like structure and defining a distal-most portion of the implant;

the distal tip tapering inward in a distal direction;

the central section sized and configured to engage the adjacent spinous processes when the implant is disposed through the interspinous space between the adjacent spinous processes;

the proximal section having a wing that extends farther outward relative to the longitudinal axis than all portions of the central section; and

a spacer slidably mated to the main body through the wing.