Method for the plasma cleaning of the surface of a material coated with an organic substance

• US 8,591,660 B2
• Filed: 12/04/2009
• Issued: 11/26/2013
• Est. Priority Date: 02/19/2002
• Status: Expired due to Term

• Current Assignee: Usinor
• Original Assignee: Usinor
• Inventors: Silberberg, Eric, Michel, Eric, Reniers, Francois, Buess-Herman, Claudine
• Primary Examiner(s): Chaudhry, Saeed T
• Application Number:
  US12/631,220
• Publication Number:
  US 20100139691A1
• Time in Patent Office: 1,453 Days
• Field of Search: 134/1.1, 134/1.2, 134/42, 216/67, 216/71, 438/905
• US Class Current: 134/1.1
• CPC Class Codes: B08B 7/0035 by radiant energy, e.g. UV, laser, light beam or the like
• CPC Class Codes: C23G 5/00 Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
• CPC Class Codes: H01J 37/32348 Dielectric barrier discharge

Abstract

The invention relates to a method of cleaning the surface of a material that is coated with an organic substance. The inventive method is characterized in that it comprises the following steps, consisting in: introducing the material into a treatment chamber, having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90 volume percent of oxygen; and generating a plasma by passing an electric discharge between the surface of the material and a dielectric-covered electrode in order to break down the organic substance under the action of the free radicals O thus produces. The invention also relates to an installation that is used to carry out said method.

Claims

1. A process for cleaning the surface of a substrate comprising a material coated with an organic substance, the cleaning process comprising:

introducing said substrate into a treatment chamber, having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90% oxygen by volume; and

generating a plasma by passing an electric discharge between the surface of said substrate and a dielectric-covered electrode, breaking down said organic substance through the action of the free radicals O^. thus produced,

inducing re-dissociation, by applying UV radiation of a suitable wavelength, of the oxygen and/or ozone molecules that are formed by recombination of the free radicals O^., concurrently with the generating the plasma,

wherein the cleaning operation comprises breaking down said organic substance on the substrate using the plasma and inducing re-dissociation of the recombined free radicals O^. produced in said plasma by the UV radiation,

wherein said cleaning operation is performed before coating the substrate with an organic or metallic coating, and

wherein the UV radiation induces the oxygen and/or ozone molecules produced away from cold arcs of the plasma, to dissociate the ozone into a molecular oxygen and a free radical O^..

2. The process as claimed in claim 1, wherein the voltage applied to initiate the discharge is sinusoidal and has a frequency of between 10 and 100 kHz.

4. The process as claimed in claim 1, wherein the material is in the form of a running strip and said introducing and generating operations are carried out continuously using installations placed in succession along the path of the running strip.

5. The process as claimed in claim 4, wherein one of the faces of said strip is treated followed in succession by the other.

6. The process as claimed in one of claim 1, wherein said material to be treated is a metallic material.

7. The process as claimed in claim 6, wherein said metallic material is steel.

8. The process as claimed in either of claim 6, wherein the process degreases the surface of metallic materials, and further comprises depositing a coating after said degreasing.

9. The process as claimed in claim 1, further comprising removing oil from the surface of metallic materials using the generated plasma.

10. The process as claimed in claim 1, wherein suitable wavelength is approximately 253 nm.

11. The process as claimed in claim 1, wherein a plurality of first units are alternated with a plurality of second units, wherein the plurality of first units generate the electric discharge, and the plurality of second units generating the UV radiation.

3. A process for cleaning the surface of a substrate comprising a material coated with an organic substance, the cleaning process comprising:

introducing said substrate into a treatment chamber, having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90% oxygen by volume; and

generating a plasma by passing an electric discharge between the surface of said substrate and a dielectric-covered electrode, breaking down said organic substance through the action of the free radicals O^. thus produced,

inducing re-dissociation, by applying UV radiation of a suitable wavelength, of the oxygen and/or ozone molecules that are formed by recombination of the free radicals O^., concurrently with the generating the plasma,

wherein the cleaning operation comprises breaking down said organic substance on the substrate using the plasma and inducing re-dissociation of the recombined free radicals O^. produced in said plasma by the UV radiation,

wherein said cleaning operation is performed before coating the substrate with an organic or metallic coating, and

wherein the energy dissipation in the discharge is less than 40 W/cm² and the voltage applied in order to initiate the discharge is less than 4.4 kV.

12. A process for cleaning the surface of a substrate coated with an organic substance, the cleaning process comprising:

introducing said substrate into a treatment chamber, having a pressure of between 10 mbar and 1 bar therein, and supplying the chamber with a gas stream containing at least 90% oxygen by volume;

generating a plasma by causing an electric discharge between the surface of said substrate and a dielectric-covered electrode, to thereby break down said organic substance through the action of the free radicals O^. produced by the discharge, thereby cleaning the substrate;

applying UV radiation of a wavelength suitable to cause re-dissociation of ozone molecules formed by recombination of said free radicals, in order to support a higher density of said free radicals than is possible by said plasma generating step alone.