Methods of decreasing sebum production in the skin

• US 8,591,876 B2
• Filed: 12/14/2011
• Issued: 11/26/2013
• Est. Priority Date: 12/15/2010
• Status: Active Grant

• Current Assignee: LNHC Incorporated
• Original Assignee: Novan, Inc.
• Inventors: Bauman, Susanne, Stasko, Nathan A.
• Primary Examiner(s): Haghighatian, Mina
• Application Number:
  US13/325,826
• Publication Number:
  US 20120156163A1
• Time in Patent Office: 713 Days
• Field of Search: 424/78.03, 514/828, 514/859, 514/864, 514/887, 423/405
• US Class Current: 424/78.03
• CPC Class Codes: A61K 2300/00 Mixtures or combinations of active ingredients, wherein at least one active ingredient is fully defined in groups A61K31/00 - A61K41/00
• CPC Class Codes: A61K 31/131 acyclic
• CPC Class Codes: A61K 31/197 the amino and the carboxyl groups being attached to the same acyclic carbon chain, e.g. gamma-aminobutyric acid [GABA], beta-alanine, epsilon-aminocaproic acid or pantothenic acid carnitine A61K31/205
• CPC Class Codes: A61K 31/80 Polymers containing hetero atoms not provided for in groups A61K31/755 - A61K31/795
• CPC Class Codes: A61K 33/00 Medicinal preparations containing inorganic active ingredients
• CPC Class Codes: A61K 38/063 Glutathione
• CPC Class Codes: A61K 45/06 Mixtures of active ingredients without chemical characterisation, e.g. antiphlogistics and cardiaca
• CPC Class Codes: A61P 17/00 Drugs for dermatological disorders
• CPC Class Codes: A61P 17/08 Antiseborrheics
• CPC Class Codes: A61P 17/10 Anti-acne agents

Abstract

Provided herein are methods of using gaseous nitric oxide and/or at least one nitric oxide source to or decrease sebum production in the skin of a subject. In some embodiments, the nitric oxide source includes small molecule and/or macromolecular NO-releasing compounds.

Claims

1. A method of decreasing sebum production in skin of a subject comprising applying a pharmaceutically acceptable composition comprising a nitric oxide (NO)-releasing compound to the skin of the subject, wherein the NO-releasing compound is present in an amount sufficient to decrease sebum production and is present in the pharmaceutically acceptable composition in an amount of 0.1% to 20% w/w in the composition, wherein the NO-releasing compound consists of N-diazeniumdiolate-functionalized macromolecules.

2. The method of claim 1, wherein the N-diazeniumdiolate-functionalized macromolecules comprise N-diazeniumdiolate co-condensed polysiloxane macromolecules.

3. The method of claim 1, wherein the pharmaceutically acceptable composition comprises at least one other therapeutic agent.

4. The method of claim 1, wherein the nitric oxide is applied at a concentration that is toxic to sebum production sites.

5. The method of claim 1, wherein the nitric oxide is applied at a concentration that is not toxic to sebum production sites.

6. The method of claim 1, wherein the nitric oxide is applied at a concentration that is preferentially toxic to sebum production sites over keratinocytes.

7. A method of decreasing sebum production in skin of a subject comprising applying to the subject a pharmaceutically acceptable composition comprising a therapeutic agent, said therapeutic agent consisting essentially of a nitric oxide (NO)-releasing compound, wherein said NO-releasing compound is present in said composition in an amount sufficient to decrease sebum production in the skin of the subject, wherein the NO-releasing compound consists of N-diazeniumdiolate-functionalized macromolecules.