Plasma display panel including EMI filter, and/or method of making the same

• US 8,592,059 B2
• Filed: 11/19/2010
• Issued: 11/26/2013
• Est. Priority Date: 08/21/2008
• Status: Expired due to Fees

• Current Assignee: Guardian Glass LLC (KOCH Industries Incorporated)
• Original Assignee: Guardian Industries Corporation (KOCH Industries Incorporated)
• Inventors: Lingle, Philip J., Den Boer, Willem
• Primary Examiner(s): Sample, David
• Assistant Examiner(s): COLGAN, LAUREN ROBINSON
• Application Number:
  US12/926,479
• Publication Number:
  US 20110133640A1
• Time in Patent Office: 1,103 Days
• Field of Search: 428/432, 428/433, 428/446, 428/697, 428/698, 428/699, 428/701, 428/702
• US Class Current: 428/701
• CPC Class Codes: H05K 9/0088 comprising a plurality of shielding layers; combining different shielding material structure
• CPC Class Codes: H05K 9/0096 for television displays, e.g. plasma display panel

Abstract

A plasma display panel (PDP) includes a frameless EMI filter supported by a glass substrate for blocking/shielding substantial amounts of electromagnetic waves, with the filter being supported by a side of the substrate opposite a viewer. In certain example embodiments, the PDP filter includes a transparent conductive coating (TCC) for electromagnetic interference (EMI) and near infrared (NIR) blocking without the need for a conductive, peripheral buss bar. Additionally, in certain example embodiments, the need for a conductive frame is reduced or eliminated. The filter has high visible transmission, and is capable of blocking/shielding electromagnetic waves.

Claims

1. A plasma display device comprising:

a plasma display panel (PDP); and

an electromagnetic interference (EMI) filter provided at a front portion of the plasma display panel, the EMI filter including an EMI coating supported by a glass substrate, the EMI coating including layers moving away from the glass substrate including;

a first high index layer having a refractive index (n) of at least about 2.2;

a first silicon-inclusive layer;

a first layer comprising zinc oxide;

a first EMI shielding layer comprising silver contacting the first layer comprising zinc oxide;

a first layer comprising an oxide of Ni and/or Cr contacting the first EMI shielding layer comprising silver;

a first metal oxide layer;

a second silicon-inclusive layer;

a second layer comprising zinc oxide;

a second EMI shielding layer comprising silver contacting the second layer comprising zinc oxide;

a second layer comprising an oxide of Ni and/or Cr contacting the second EMI shielding layer comprising silver;

a second metal oxide layer;

a third silicon-inclusive layer;

a third layer comprising zinc oxide;

a third EMI shielding layer comprising silver contacting the third layer comprising zinc oxide;

a third layer comprising an oxide of Ni and/or Cr contacting the third EMI shielding layer comprising silver; and

a third metal oxide layer;

a fourth silicon-inclusive layer;

a fourth layer comprising zinc oxide;

a fourth EMI shielding layer comprising silver contacting the third layer comprising zinc oxide;

a fourth layer comprising an oxide of Ni and/or Cr contacting the third EMI shielding layer comprising silver,

wherein the EMI filter has a sheet resistance of greater than about 1.2 ohms/square, and

wherein thicknesses of both the first and fourth EMI shielding layers are less than thicknesses of the second and third EMI shielding layers.

2. The plasma display device of claim 1, wherein the first high index layer comprises an oxide of titanium.

3. The plasma display device of claim 1, further comprising a second high index layer having a refractive index of at least 2.2, the first and second high index layers comprising oxides of titanium,

wherein the second high index layer is located between the third silicon-inclusive layer and the third layer comprising zinc oxide.

4. The plasma display device of claim 1, wherein each of the layers comprising a metal oxide comprises an oxide of tin.

5. The plasma display device of claim 1, wherein the glass substrate and the EMI coating combined have a visible transmission of at least 65%.

6. The plasma display device of claim 1, wherein the EMI filter directly contacts the PDP.

7. The plasma display device of claim 1 wherein the first EMI shielding layer is from 55-70 angstroms thick and the second EMI shielding layer is from 80-90 angstroms thick.

8. The plasma display device of claim 7, wherein the third EMI shielding layer is from 80-100 angstroms thick and the fourth EMI shielding layer is from 60-70 angstroms thick.

9. The plasma display device of claim 1, wherein the third EMI shielding layer is from 80-100 angstroms thick and the fourth EMI shielding layer is from 60-70 angstroms thick.

10. A plasma display device comprising:

a plasma display panel (PDP); and

an electromagnetic interference (EMI) filter provided at a front portion of the plasma display panel, the EMT filter including an EMI coating supported by a glass substrate, the EMI coating including layers moving away from the glass substrate including;

a first high index layer having a refractive index (n) of at least about 2.2;

a first silicon-inclusive layer;

a first layer comprising zinc oxide;

a first EMI shielding layer comprising silver contacting the first layer comprising zinc oxide;

a first layer comprising an oxide of Ni and/or Cr contacting the first EMI shielding layer comprising silver;

a first metal oxide layer;

a second silicon-inclusive layer;

a second layer comprising zinc oxide;

a second EMI shielding layer comprising silver contacting the second layer comprising zinc oxide;

a second layer comprising an oxide of Ni and/or Cr contacting the second EMI shielding layer comprising silver;

a second metal oxide layer;

a third silicon-inclusive layer;

a third layer comprising zinc oxide;

a third EMI shielding layer comprising silver contacting the third layer comprising zinc oxide;

a third layer comprising an oxide of Ni and/or Cr contacting the third EMI shielding layer comprising silver; and

a third metal oxide layer;

a fourth silicon-inclusive layer;

a fourth layer comprising zinc oxide;

a fourth EMI shielding layer comprising silver contacting the third layer comprising zinc oxide;

a fourth layer comprising an oxide of Ni and/or Cr contacting the third EMI shielding layer comprising silver, and

wherein thicknesses of both the first and fourth EMI shielding layers are less than thicknesses of the second and third EMI shielding layers.

11. The plasma display device of claim 10, wherein the first EMI shielding layer is from 55-70 angstroms thick and the second EMI shielding layer is from 80-90 angstroms thick.

12. The plasma display device of claim 11, wherein the third EMI shielding layer is from 80-100 angstroms thick and the fourth EMI shielding layer is from 60-70 angstroms thick.

13. The plasma display device of claim 10, wherein the third EMI shielding layer is from 80-100 angstroms thick and the fourth EMI shielding layer is from 60-70 angstroms thick.