Semiconductor device
First Claim
1. A semiconductor device comprising:
- an oxide semiconductor film having island-shaped;
a gate insulating film over the oxide semiconductor film;
a gate electrode being in contact with the gate insulating film and provided at a position overlapping with the oxide semiconductor film;
an interlayer insulating film over the gate insulating film and the gate electrode;
an opening formed in the gate insulating film and the interlayer insulating film and reaching the oxide semiconductor film; and
a source electrode or a drain electrode formed to fill the opening and being in contact with the oxide semiconductor film,wherein a side surface of the oxide semiconductor film has a taper angle greater than or equal to 1° and
less than 10°
, andwherein at least part of the source electrode or the drain electrode is in contact with the side surface.
1 Assignment
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Accused Products
Abstract
A semiconductor device which achieves miniaturization with favorable characteristics maintained is provided. In addition, a miniaturized semiconductor device is provided with high yield. In a semiconductor device including an oxide semiconductor, the contact resistance between the oxide semiconductor and the source electrode or the drain electrode is reduced with miniaturization advanced. Specifically, an oxide semiconductor film is processed to be an island-shaped oxide semiconductor film whose side surface has a tapered shape. Further, the side surface has a taper angle greater than or equal to 1° and less than 10°, and at least part of the source electrode and the drain electrode is in contact with the side surfaces of the oxide semiconductor film. With such a structure, the contact region of the oxide semiconductor film and the source electrode or the drain electrode is increased, whereby the contact resistance is reduced.
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Citations
10 Claims
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1. A semiconductor device comprising:
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an oxide semiconductor film having island-shaped; a gate insulating film over the oxide semiconductor film; a gate electrode being in contact with the gate insulating film and provided at a position overlapping with the oxide semiconductor film; an interlayer insulating film over the gate insulating film and the gate electrode; an opening formed in the gate insulating film and the interlayer insulating film and reaching the oxide semiconductor film; and a source electrode or a drain electrode formed to fill the opening and being in contact with the oxide semiconductor film, wherein a side surface of the oxide semiconductor film has a taper angle greater than or equal to 1° and
less than 10°
, andwherein at least part of the source electrode or the drain electrode is in contact with the side surface. - View Dependent Claims (2, 3, 4, 5)
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6. A semiconductor device comprising:
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an oxide semiconductor film having island-shaped; a gate insulating film over the oxide semiconductor film; a gate electrode being in contact with the gate insulating film and provided at a position overlapping with the oxide semiconductor film; an interlayer insulating film over the gate insulating film and the gate electrode; an opening formed in the gate insulating film and the interlayer insulating film and reaching the oxide semiconductor film; and a source electrode or a drain electrode formed to fill the opening and being in contact with the oxide semiconductor film, wherein the oxide semiconductor film has a side surface with continuous curvature having a taper angle greater than or equal to 1° and
less than 10°
, andwherein at least part of the source electrode or the drain electrode is in contact with the side surface. - View Dependent Claims (7, 8, 9, 10)
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Specification