Charged particle beam processing system with visual and infrared imaging
First Claim
1. A charged particle beam system for processing a substrate, comprising:
- a charged particle column configured to produce a beam of charged particles which can be focused on the surface of the substrate in a vacuum chamber;
an in-vacuum optical subsystem positioned inside the vacuum chamber, the optical subsystem configured to collect scattered infrared radiation and visible light from the surface and regions near the surface of the substrate;
an illumination subsystem positioned outside the vacuum chamber configured to provide infrared radiation and visible light to the surface of the substrate;
an imaging subsystem, configured to focus the scattered infrared radiation and visible light collected by the in-vacuum optical subsystem onto one or more detectors positioned outside the vacuum chamber; and
a vacuum viewport to provide an optical path between the inside of the vacuum chamber and the outside of the vacuum chamber, the vacuum viewport including a transparent element that is tilted with respect to the optical path of the light from the illumination system to reduce the amount of reflected radiation entering at least one of the detectors.
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Abstract
A charged particle beam system for processing substrates is disclosed, comprising a charged particle column, combination infrared radiation and visible light illumination and imaging subsystems, in-vacuum optics, and a precision stage for supporting and positioning the substrate alternately under the charged particle column and the imaging system. The axes of the charged particle column and imaging system are offset to enable much closer working distances for both imaging and beam processing than would be possible in a single integrated assembly. A method for extremely accurately calibrating the offset between the column and imaging system is disclosed, enabling beam processing at precisely-determined locations on the substrate. The imaging system is capable of locating sub-surface features on the substrate which cannot be seen using the charged particle beam. Two illumination modes are disclosed, enabling both bright-field and dark-field imaging in infrared radiation and visible light.
14 Citations
16 Claims
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1. A charged particle beam system for processing a substrate, comprising:
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a charged particle column configured to produce a beam of charged particles which can be focused on the surface of the substrate in a vacuum chamber; an in-vacuum optical subsystem positioned inside the vacuum chamber, the optical subsystem configured to collect scattered infrared radiation and visible light from the surface and regions near the surface of the substrate; an illumination subsystem positioned outside the vacuum chamber configured to provide infrared radiation and visible light to the surface of the substrate; an imaging subsystem, configured to focus the scattered infrared radiation and visible light collected by the in-vacuum optical subsystem onto one or more detectors positioned outside the vacuum chamber; and a vacuum viewport to provide an optical path between the inside of the vacuum chamber and the outside of the vacuum chamber, the vacuum viewport including a transparent element that is tilted with respect to the optical path of the light from the illumination system to reduce the amount of reflected radiation entering at least one of the detectors. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification