Microfeature workpieces having conductive interconnect structures formed by chemically reactive processes, and associated systems and methods
First Claim
1. A microfeature workpiece, comprising:
- a substrate having a first surface, a second surface, and a via, wherein the via has opposing wall portions extending entirely through the substrate;
a bond site carried by the substrate, wherein the opposing wall portions extend through the bond site; and
a copper compound substantially filling the via, wherein the bond site is electrically accessible from the second surface of the substrate via the copper compound.
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Accused Products
Abstract
Microfeature workpieces having conductive vias formed by chemically reactive processes, and associated systems and methods are disclosed. A method in accordance with one embodiment includes disposing a conductive lining on walls of a via in a microfeature workpiece, so that a space is located between opposing portions of the lining facing toward each other from opposing portions of the wall. The method can further include chemically reacting the lining with a reactive material to form a chemical compound from a constituent of the reactive material and a constituent of the lining. The method can still further include at least partially filling the space with the compound. In particular embodiments, the conductive lining includes copper, the reactive material includes sulfur hexafluoride, and the chemical compound that at least partially fills the space in the via includes copper sulfide.
485 Citations
21 Claims
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1. A microfeature workpiece, comprising:
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a substrate having a first surface, a second surface, and a via, wherein the via has opposing wall portions extending entirely through the substrate; a bond site carried by the substrate, wherein the opposing wall portions extend through the bond site; and a copper compound substantially filling the via, wherein the bond site is electrically accessible from the second surface of the substrate via the copper compound. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A microfeature workpiece, comprising:
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a substrate having a thickness; a bond site carried by the substrate; and an interconnect structure extending through the thickness of the substrate and through the bond site, the interconnect structure having a sidewall, a first conductive material inward from the sidewall, and a second conductive material inward from the first conductive material, wherein the second conductive material at least partially fills a remaining portion of the interconnect structure, and wherein the second conductive material comprises a conductive compound that includes a constituent of the first conductive material. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18)
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19. A system, comprising:
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a processor; and a microfeature die including a substrate, a bond site carried by the substrate, and an interconnect structure extending through the substrate and the bond site, the bond site being electrically accessible from a back side of the substrate via the interconnect structure, wherein the interconnect structure includes a first conductive material inward from a sidewall of the interconnect structure and a second conductive material at least substantially filling a remainder of the interconnect structure, and wherein the first and second conductive materials do not include solder, the second conductive material comprising a conductive compound that includes a constituent of the first conductive compound. - View Dependent Claims (20, 21)
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Specification