Mirror arrays for maskless photolithography and image display
First Claim
1. A micromirror having an exposed surface area, the micromirror comprising:
- a polymeric micromirror base;
a reflective dielectric multilayer disposed over the polymeric micromirror base, wherein the reflective dielectric multilayer comprises 10 or more dielectric layers;
a device layer positioned below the polymeric micromirror base for adjusting a position of the micromirror; and
a resistive heating element in thermal contact with the reflective dielectric multilayer;
wherein the reflective dielectric multilayer covers more than 50% of the exposed surface area and the reflective dielectric multilayer has a reflectivity selected over the range of 95% to 100% for at least a portion of electromagnetic radiation having wavelengths in the range of 150 to 1100 nm.
1 Assignment
0 Petitions
Accused Products
Abstract
Micromirrors and micromirror arrays described herein are useful, for example in maskless photolithography systems and methods and projection display devices and methods. According to one aspect, the micromirrors comprise a polymer structural layer and a reflective dielectric multilayer for selective reflection and/or redirection of incoming electromagnetic radiation. According to another aspect, incorporation of a reflective dielectric multilayer allows for use of polymer structural materials in micromirrors and prevents damage to such polymer materials due to excessive heating from absorption of electromagnetic radiation, as the reflective dielectric multilayers are highly reflective and minimize heating of the micromirror components. According to yet a further aspect, top down fabrication methods are described herein for making a micromirror comprising a polymer structural layer and a reflective dielectric multilayer.
-
Citations
28 Claims
-
1. A micromirror having an exposed surface area, the micromirror comprising:
-
a polymeric micromirror base; a reflective dielectric multilayer disposed over the polymeric micromirror base, wherein the reflective dielectric multilayer comprises 10 or more dielectric layers; a device layer positioned below the polymeric micromirror base for adjusting a position of the micromirror; and a resistive heating element in thermal contact with the reflective dielectric multilayer; wherein the reflective dielectric multilayer covers more than 50% of the exposed surface area and the reflective dielectric multilayer has a reflectivity selected over the range of 95% to 100% for at least a portion of electromagnetic radiation having wavelengths in the range of 150 to 1100 nm. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
-
-
26. A large area micromirror array comprising a plurality of micromirror elements, wherein each micromirror element has an exposed surface area and comprises a polymeric micromirror base, a reflective dielectric multilayer disposed over the polymeric micromirror base and a resistive heating element in thermal contact with the reflective dielectric multilayer, wherein the reflective dielectric multilayer comprises 10 or more dielectric layers, wherein the reflective dielectric multilayer covers 50% to 100% of the exposed surface area and wherein the reflective dielectric multilayer has a reflectivity selected over the range of 95% to 100% for at least a portion of electromagnetic radiation having wavelengths in the range of 150 to 1100 nm.
-
27. A digital micromirror display device comprising:
-
a source of electromagnetic radiation; and a micromirror array comprising a plurality of micromirror elements, wherein each micromirror element has an exposed surface area exposed to electromagnetic radiation from the source and comprises a polymeric micromirror base and a reflective dielectric multilayer disposed over the polymeric base and a resistive heating element in thermal contact with the reflective dielectric multilayer, wherein the reflective dielectric multilayer comprises 10 or more dielectric layers, wherein the reflective dielectric multilayer covers 50% to 100% of the exposed surface area and wherein the reflective dielectric multilayer has a reflectivity selected over the range of 95% to 100% for at least a portion of electromagnetic radiation having wavelengths in the range of 150 to 1100 nm.
-
-
28. A method of displaying an image, the method comprising the steps of:
-
providing a surface for displaying the image; providing a source of electromagnetic radiation; providing an array of micromirror elements, wherein each micromirror element has an exposed surface area exposed to electromagnetic radiation from the source and comprises a polymeric micromirror base, a reflective dielectric multilayer disposed over the polymeric micromirror base and a resistive heating element in thermal contact with the reflective dielectric multilayer, wherein the reflective dielectric multilayer comprises 10 or more dielectric layers, wherein the reflective dielectric multilayer covers 50% to 100% of the exposed surface area and wherein the reflective dielectric multilayer has a reflectivity selected over the range of 95% to 100% for at least a portion of electromagnetic radiation having wavelengths in the range of 150 to 1100 nm; controlling a position of each micromirror element of the array such that electromagnetic radiation from the source is reflected from each micromirror element to a location either on or off of the surface; and directing electromagnetic radiation from the source onto the micromirror array, thereby displaying an image on the surface.
-
Specification