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Thin film transistor and method of forming the same

  • US 8,614,442 B2
  • Filed: 02/17/2011
  • Issued: 12/24/2013
  • Est. Priority Date: 02/16/2007
  • Status: Active Grant
First Claim
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1. A thin film transistor, comprising:

  • a channel layer including an oxide semiconductor material;

    a source electrode and a drain electrode facing each other on the channel layer;

    a protective layer under the source electrode and the drain electrode and covering the channel layer, wherein the protective layer has a dumbbell shape or a rectangular shape covering a region of an upper surface of the channel layer except for two regions of the upper surface;

    a gate electrode configured to apply an electric field to the channel layer; and

    a gate insulating layer interposed between the gate electrode and the channel layer.wherein the protective layer having the dumbbell shape includes a central portion and enlarged portions disposed at both ends of the central portion, and a width of the enlarged portions is greater than a width of the channel layer, so that the entire region of the channel layer except for the two regions of the upper surface is covered by the protective layer.

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