Spine distraction implant and method

• US 8,617,211 B2
• Filed: 03/28/2007
• Issued: 12/31/2013
• Est. Priority Date: 01/02/1997
• Status: Expired due to Fees

• Current Assignee: Kyphon SARL (Medtronic Plc)
• Original Assignee: Warsaw Orthopedic Incorporated (Medtronic Plc)
• Inventors: Zucherman, James F., Hsu, Ken Y., Fallin, T. Wade, Winslow, Charles J., Klyce, Henry A.
• Primary Examiner(s): Truong, Kevin T.
• Assistant Examiner(s): SEVILLA, CHRISTIAN ANTHONY
• Application Number:
  US11/692,298
• Publication Number:
  US 20080015700A1
• Time in Patent Office: 2,470 Days
• Field of Search: 623 1711- 1716, 606/86.A, 606/99, 606/246, 606/248, 606/249, 606/279
• US Class Current: 606/249
• CPC Class Codes: A61B 17/025 Joint distractors
• CPC Class Codes: A61B 17/66 Alignment, compression or distraction mechanisms
• CPC Class Codes: A61B 17/7062 Devices acting on, attached to, or simulating the effect of, vertebral processes, vertebral facets or ribs rib fixation devices A61B17/8076; Tools for such devices
• CPC Class Codes: A61B 17/7064 Devices acting on, attached to, or simulating the effect of, vertebral facets; Tools therefor
• CPC Class Codes: A61B 17/7065 Devices with changeable shape, e.g. collapsible or having retractable arms to aid implantation; Tools therefor
• CPC Class Codes: A61B 17/7068 Devices comprising separate rigid parts, assembled in situ, to bear on each side of spinous processes; Tools therefor
• CPC Class Codes: A61B 17/7071 Implants for expanding or repairing the vertebral arch or wedged between laminae or pedicles; Tools therefor
• CPC Class Codes: A61B 2017/00867 shape memory effect for prostheses A61F2210/0014
• CPC Class Codes: A61B 2017/0256 for the spine
• CPC Class Codes: A61K 31/37 Coumarins, e.g. psoralen
• CPC Class Codes: Y10S 606/91 Polymer

Abstract

A spine distraction implant alleviates pain associated with spinal stenosis and facet arthropathy by expanding the volume in the spine canal and/or neural foramen. The implant provides a spinal extension stop while allowing freedom of spinal flexion.

Claims

1. A method, comprising:

inserting at least a portion of an implant having a first member and a second member between adjacent spinous processes in a first configuration;

subsequently, moving the second member of the implant relative to the first member of the implant into a second configuration such that tips of the first and second members are disposed farther away from each other in the second configuration than in the first configuration;

wherein, in the second configuration, the implant extends transversely through a sagittal plane defined by the adjacent spinous processes at a location directly between the spinous processes;

wherein said moving comprises moving the tip of the second member from a position not adjacent a lateral side of one of the spinous processes to a position adjacent the lateral side of the one of the spinous processes.

2. The method of claim 1 wherein the moving includes moving the second member of the implant relative to the first member of the implant such that the second member extends from the implant to maintain the implant relative to the adjacent spinous processes within a range of motion.

3. The method of claim 1 wherein the moving includes moving the second member in a direction substantially parallel to a longitudinal axis of the implant.

4. The method of claim 1 wherein the moving includes applying a force to the implant.

5. The method of claim 1, wherein a portion of the implant is configured to deform.

6. The method of claim 1 further comprising locking the implant after the moving to prevent further movement of the second member relative to the implant.

7. The method of claim 1, further comprising distracting the adjacent spinous processes before the inserting.

17. The method of claim 1 wherein an axial length of the implant along a longitudinal axis of the implant is greater in the first configuration than in the second configuration.

18. The method of claim 1 wherein a dimension of the implant along an axis substantially normal to a longitudinal axis of the implant is less when the implant is in the first configuration than when the implant is in the second configuration.

19. The method of claim 1 wherein, in the second configuration, at least a portion of the first member is disposed directly between the adjacent spinous processes.

20. The method of claim 1 wherein, in the second configuration, both the first and second members extend lateral to the sagittal plane.

21. The method of claim 1 wherein said moving comprises the tip of the second member projects outwardly from the first member relative to the lateral side of the one of the spinous processes.

22. The method of claim 1 wherein said first member and said second member are substantially identical.

8. A method, comprising:

inserting percutaneously an implant having at least a first portion and a second portion such that the first portion and the second portion are inserted simultaneously;

disposing percutaneously at least a portion of the first portion of the implant between adjacent spinous processes such that the first portion extends transversely through a sagittal plane defined by the adjacent spinous processes;

while the first portion extends transversely through the sagittal plane directly between the adjacent spinous processes, applying a force to the second portion of the implant such that the second portion moves relative to the first portion;

wherein when applying the force, the first portion and a tip of the second portion move away from each other and the tip of the second portion moves from a position not adjacent a lateral side of one of the spinous processes to a position adjacent the lateral side of the one of the spinous processes.

9. The method of claim 8, wherein the disposing includes disposing the implant via a lateral access path such that a portion of the implant is disposed adjacent lateral sides of the spinous processes.

10. The method of claim 8, wherein the applying includes applying the force in a direction substantially parallel to a longitudinal axis of the implant.

11. The method of claim 8 wherein a distance between a first end of the implant and a second end of the implant is less after applying the force than prior to applying the force.

12. The method of claim 8 wherein a dimension of the implant along an axis substantially normal to a longitudinal axis of the implant is greater after applying the force than prior to applying the force.

13. The method of claim 8 wherein the second portion maintains a range of motion of the implant relative to the adjacent spinous processes and extends outwardly from the implant after the applying.

14. The method of claim 8, wherein a portion of the implant is configured to deform.

15. The method of claim 8 further comprising locking the implant to limit movement of the second portion relative to the implant after the applying.

16. The method of claim 8, further comprising distracting the adjacent spinous processes before the inserting.

23. The method of claim 8 wherein the second portion is telescopically received in the first portion.

24. The method of claim 8 wherein said first portion and said second portion are substantially identical.

25. The method of claim 8 wherein, during and in response to said applying the force, the tip of the second portion projects outwardly relative to the sagittal plane.