Determining lithographic set point using optical proximity correction verification simulation

• US 8,619,236 B2
• Filed: 11/24/2010
• Issued: 12/31/2013
• Est. Priority Date: 11/24/2010
• Status: Expired due to Fees

• Current Assignee: GlobalFoundries, Inc.
• Original Assignee: International Business Machines Corporation
• Inventors: Bruce, James A., Conrad, Edward W., Smolinski, Jacek G.
• Primary Examiner(s): Ton, Toan
• Assistant Examiner(s): RIDDLE, CHRISTINA A
• Application Number:
  US12/953,511
• Publication Number:
  US 20120127442A1
• Time in Patent Office: 1,133 Days
• Field of Search: 355/52, 355/53, 355/55, 355/72, 355/75, 355/77, 355 67- 71, 250/492.1, 250/492.2, 250/492.22, 250/548, 430/5, 430/8, 430/22, 430/30, 430/311, 430/312, 430/321, 716/52, 716/53, 716/54, 716/55, 716110-112, 382/144, 700/97, 700/110, 700/121
• US Class Current: 355/77
• CPC Class Codes: G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions

Abstract

The subject matter disclosed herein relates to determining a lithographic set point using simulations of optical proximity correction verification. In one embodiment, a computer-implemented method of determining a lithographic tool set point for a lithographic process is disclosed. The method may include: providing a model of a production lithographic process including simulations of printed shapes; analyzing the model of the production lithographic process to determine whether a set of structures on a production mask used in the production lithographic process to create the printed shapes will fail under a plurality of set points; determining an operating region of set points where the set of structures on the production mask does not fail; and establishing a set point location within the operating region based upon a set point selection function.

Claims

1. A computer-implemented method of determining a lithographic tool set point for a lithographic process, the method comprising:

providing a model of a production lithographic process including simulations of printed shapes;

analyzing the model of the production lithographic process to determine whether a set of structures on a production mask used in the production lithographic process to create the printed shapes will fail under a plurality of set points, wherein the analyzing includes;

determining that a set point in the plurality of set points is a failure point;

establishing the failure point as an outer limit for at least one process condition; and

testing another set point in the plurality of set points within the outer limit to determine if the another set point is another failure point;

determining an operating region of set points where the set of structures on the production mask does not fail; and

establishing a set point location within the operating region based upon a set point selection function.

2. The computer-implemented method of claim 1, wherein the analyzing further includes moving the outer limit to the another set point in the case that the another set point is another failure point.

3. The computer-implemented method of claim 2, wherein the analyzing further includes iteratively repeating the determining of the set point, the establishing of the failure point as an outer limit, and the testing of the another set point to determine if the another set point is another failure point.

4. The computer-implemented method of claim 1, wherein the set point selection function includes at least one of the following:

a centroid selection function, a frequency selection function, or a weighted criticality selection function.

5. A computer system comprising:

at least one computing device configured to determine a lithographic tool set point for a lithographic process by performing actions comprising;

providing a model of a production lithographic process including simulations of printed shapes;

analyzing the model of the production lithographic process to determine whether a set of structures on a production mask used in the production lithographic process to create the printed shapes will fail under a plurality of set points, wherein the analyzing includes;

determining that a set point in the plurality of set points is a pass point;

establishing the pass point as an inner limit for at least one process condition; and

testing another set point in the plurality of set points outside the inner limit to determine if the another set point is another pass point;

determining an operating region of set points where the set of structures on the production mask does not fail; and

establishing a set point location within the operating region based upon a set point selection function.

6. The computer system of claim 5, wherein the analyzing further includes:

moving the inner limit to the another set point in the case that the another set point is another pass point; and

iteratively repeating the determining of the set point, the establishing of the pass point as an inner limit, and the testing of the another set point to determine if the another set point is another pass point.

7. The computer system of claim 6, wherein the analyzing further includes iteratively repeating the determining of the set point, the establishing of the pass point as an inner limit, and the testing of the another set point to determine if the another set point is another pass point.

8. The computer system of claim 5, wherein the set point selection function includes at least one of the following:

a centroid selection function, a frequency selection function, or a weighted criticality selection function.

9. A computer program comprising program code embodied in at least one non-transitory computer readable medium, which when executed, enables a computer system to implement a method for determining a lithographic tool set point for a lithographic process, the method comprising:

providing a model of a production lithographic process including simulations of printed shapes;

analyzing the model of the production lithographic process to determine whether a set of structures on a production mask used in the production lithographic process to create the printed shapes will fail under a plurality of set points, wherein the analyzing includes;

determining that a set point in the plurality of set points is a failure point;

establishing the failure point as an outer limit for at least one process condition; and

testing another set point in the plurality of set points within the outer limit to determine if the another set point is another failure point;

determining an operating region of set points where the set point of structures on the production mask does not fail; and

establishing a set point location within the operating region based upon a set point selection function.

10. The computer system of claim 9, wherein the analyzing further includes:

moving the outer limit to the another set point in the case that the another set point is another failure point; and

iteratively repeating the determining of the set point, the establishing of the failure point as an outer limit, and the testing of the another set point to determine if the another set point is another failure point.

11. The computer system of claim 9, wherein the set point selection function includes at least one of the following:

a centroid selection function, a frequency selection function, or a weighted criticality selection function.