Out-of plane MEMS resonator with static out-of-plane deflection
First Claim
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1. A method of forming a microelectromechanical systems (MEMS) device, the method comprising:
- forming an electrode on a substrate;
forming a structural layer on the substrate, the structural layer disposed about a perimeter of the electrode and having a thickness and a residual film stress gradient; and
releasing the structural layer to form a resonator coupled to the substrate, the residual film stress gradient deflecting a first portion of the resonator out of a plane defined by a surface of the electrode,wherein the resonator comprises a cantilever beam and a first plurality of lattice beams extending along a length of the cantilever beam.
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Abstract
A method of forming a microelectromechanical systems (MEMS) device includes forming an electrode on a substrate. The method includes forming a structural layer on the substrate. The structural layer is disposed about a perimeter of the electrode and has a residual film stress gradient. The method includes releasing the structural layer to form a resonator coupled to the substrate. The residual film stress gradient deflects a first portion of the resonator out of a plane defined by a surface of the electrode.
49 Citations
20 Claims
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1. A method of forming a microelectromechanical systems (MEMS) device, the method comprising:
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forming an electrode on a substrate; forming a structural layer on the substrate, the structural layer disposed about a perimeter of the electrode and having a thickness and a residual film stress gradient; and releasing the structural layer to form a resonator coupled to the substrate, the residual film stress gradient deflecting a first portion of the resonator out of a plane defined by a surface of the electrode, wherein the resonator comprises a cantilever beam and a first plurality of lattice beams extending along a length of the cantilever beam. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of forming a microelectromechanical systems (MEMS) device, the method comprising:
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forming an electrode on a substrate; forming a structural layer on the substrate, the structural layer disposed about a perimeter of the electrode and having a residual film stress gradient; and releasing the structural layer to form a resonator coupled to the substrate, the residual film stress gradient deflecting a first portion of the resonator out of a plane defined by a surface of the electrode, wherein forming the structural layer further comprises at least one of laser recrystallization or metal-induced crystallization to vary the crystallinity over the thickness of the structural layer. - View Dependent Claims (16, 17)
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18. A method of forming a microelectromechanical systems (MEMS) device, the method comprising:
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forming an electrode on a substrate; forming a structural layer on the substrate, the structural layer disposed about a perimeter of the electrode and having a residual film stress gradient; releasing the structural layer to form a resonator coupled to the substrate, the residual film stress gradient deflecting a first portion of the resonator out of a plane defined by a surface of the electrode; and forming a tuning plate above a second electrode. - View Dependent Claims (19, 20)
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Specification