Method and apparatus for performing dark field double dipole lithography (DDL)
First Claim
1. A method of generating complementary masks for use in a dark field double dipole imaging process, the method comprising the steps of:
- identifying a target pattern having a plurality of features, the plurality of features comprising horizontal and vertical features;
decomposing the target pattern into a horizontal dark field mask and a vertical dark field mask, the decomposing comprising performing model-based optimization of both masks so as to optimize imaging performance criteria after double exposure of one or more of the features in the target pattern during the dark field double dipole imaging process using both masks and linear polarization.
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Abstract
A method of generating complementary masks for use in a dark field double dipole imaging process. The method includes the steps of identifying a target pattern having a plurality of features, including horizontal and vertical features; generating a horizontal mask based on the target pattern, where the horizontal mask includes low contrast vertical features. The generation of the horizontal mask includes the steps of optimizing the bias of the low contrast vertical features contained in the horizontal mask; and applying assist features to the horizontal mask. The method further includes generating a vertical mask based on the target pattern, where the vertical mask contains low contrast horizontal features. The generation of the vertical mask includes the steps of optimizing the bias of low contrast horizontal features contained in the vertical mask; and applying assist features to the vertical mask.
36 Citations
14 Claims
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1. A method of generating complementary masks for use in a dark field double dipole imaging process, the method comprising the steps of:
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identifying a target pattern having a plurality of features, the plurality of features comprising horizontal and vertical features; decomposing the target pattern into a horizontal dark field mask and a vertical dark field mask, the decomposing comprising performing model-based optimization of both masks so as to optimize imaging performance criteria after double exposure of one or more of the features in the target pattern during the dark field double dipole imaging process using both masks and linear polarization. - View Dependent Claims (2, 3)
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4. A method of generating complementary masks for use in a dark field double dipole imaging process, said method comprising the steps of:
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identifying a target pattern having a plurality of features, said plurality of features comprising horizontal and vertical features; generating a horizontal dark field mask based on said target pattern, said horizontal dark field mask including low contrast features, said generation of said horizontal dark field mask comprising the steps of; optimizing the bias of said low contrast features contained in said horizontal dark field mask; and applying assist features to said horizontal dark field mask; generating a vertical dark field mask based on said target pattern, said vertical dark field mask containing low contrast features, said generation of said vertical dark field mask comprising the steps of; optimizing the bias of low contrast features contained in said vertical dark field mask; and applying assist features to said vertical dark field mask; and decomposing the target pattern into the horizontal dark field mask and the vertical dark field mask, the decomposing comprising; performing model-based optimization of both masks so as to optimize imaging performance criteria after double exposure of a feature in the target pattern during the dark field double dipole imaging process using both masks and linear polarization. - View Dependent Claims (5, 6, 7, 8, 9)
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10. A method of generating complementary masks for use in a dark field double dipole lithographic imaging process, said method comprising the steps of:
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identifying a target pattern having a plurality of features, said plurality of features comprising horizontal and vertical features; generating a horizontal dark field mask based on said target pattern, said horizontal dark field mask including low contrast features, said generation of said horizontal dark field mask comprising the steps of; optimizing the bias of said low contrast features contained in said horizontal dark field mask; applying assist features to said horizontal dark field mask; and re-performing the step of optimizing the bias of said low contrast features after the step of applying said assist features to said horizontal dark field mask; and generating a vertical dark field mask based on said target pattern, said vertical dark field mask containing low contrast features, said generation of said vertical dark field mask comprising the steps of; optimizing the bias of low contrast features contained in said vertical dark field mask; and applying assist features to said vertical dark field mask, wherein one or both of said steps of optimizing the bias of said low contrast features contained in said horizontal dark field mask and said vertical dark field mask includes maximizing one or more imaging performance criteria using linear polarization, and wherein dimensions of said assist features applied to said horizontal dark field mask and said vertical dark field masks are adjusted based on optical energy associated with the dark field double dipole lithographic imaging process. - View Dependent Claims (11, 12, 13, 14)
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Specification