Deposition of LiCoO 2
First Claim
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1. A method of depositing a LiCoO2 layer, comprising:
- placing a substrate in a reactor;
flowing a gaseous mixture including argon and oxygen through the reactor;
applying pulsed DC power to a densified conductive ceramic LiCoO2 sputter target having a resistivity of about 3 kΩ
-10 kΩ
, the densified conductive ceramic LiCoO2 sputter target being positioned opposite the substrate, wherein the conductive ceramic LiCoO2 sputter target comprises Li and Co oxides, Li and Co metallic additions, and at least one dopant of Ni, Si, or Nb;
applying an RF bias power to the substrate; and
filtering the RF bias power with a narrow-band rejection filter from coupling into the pulsed DC power,wherein a crystalline layer of LiCoO2 having a columnar structure is deposited over the substrate.
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Abstract
In accordance with the present invention, deposition of LiCoO2 layers in a pulsed-dc physical vapor deposition process is presented. Such a deposition can provide a low-temperature, high deposition rate deposition of a crystalline layer of LiCoO2 with a desired <101> or <003> orientation. Some embodiments of the deposition address the need for high rate deposition of LiCoO2 films, which can be utilized as the cathode layer in a solid state rechargeable Li battery. Embodiments of the process according to the present invention can eliminate the high temperature (>700° C.) anneal step that is conventionally needed to crystallize the LiCoO2 layer.
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Citations
17 Claims
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1. A method of depositing a LiCoO2 layer, comprising:
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placing a substrate in a reactor; flowing a gaseous mixture including argon and oxygen through the reactor; applying pulsed DC power to a densified conductive ceramic LiCoO2 sputter target having a resistivity of about 3 kΩ
-10 kΩ
, the densified conductive ceramic LiCoO2 sputter target being positioned opposite the substrate, wherein the conductive ceramic LiCoO2 sputter target comprises Li and Co oxides, Li and Co metallic additions, and at least one dopant of Ni, Si, or Nb;applying an RF bias power to the substrate; and filtering the RF bias power with a narrow-band rejection filter from coupling into the pulsed DC power, wherein a crystalline layer of LiCoO2 having a columnar structure is deposited over the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification