Lithographic apparatus and device manufacturing method

• US 8,638,419 B2
• Filed: 01/07/2011
• Issued: 01/28/2014
• Est. Priority Date: 12/20/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Jansen, Hans, Baselmans, Johannes Jacobus Matheus, Hoogendam, Christiaan Alexander, Mertens, Jeroen Johannes Sophia, Mulkens, Johannes Catharinus Hubertus, Stavenga, Marco Koert, Streefkerk, Bob, Van Der Hoeven, Jan Cornelis, Grouwstra, Cedric Desire, Donders, Sjoerd Nicolaas Lambertus
• Primary Examiner(s): Gordon, Steven H Whitesell
• Assistant Examiner(s): Asfaw, Mesfin T
• Application Number:
  US12/986,576
• Publication Number:
  US 20110109887A1
• Time in Patent Office: 1,117 Days
• Field of Search: 355/30, 355/53, 355/72, 355/77
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70925 Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Abstract

A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

Claims

1. A lithographic apparatus, comprising:

a projection system configured to project a patterned beam of radiation onto a radiation-sensitive substrate, the projection system comprising a final optical element adjacent the substrate;

a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid in the space between the projection system and the substrate such that the liquid is in direct contact with the projection system and the liquid confinement structure, the liquid confinement structure having an aperture between the final optical element and the substrate to allow passage of the beam of radiation through the liquid to an exposure field of the substrate; and

a stage movable with respect to the liquid confinement structure, the stage having a width wider than a width of the aperture and the stage having a cleaning device configured to clean a surface of the final optical element, of the liquid confinement structure, or of both the projection system and the liquid confinement structure.

2. The apparatus according to claim 1, wherein the cleaning device comprises an ultrasonic transmitter.

3. The apparatus of claim 2, wherein the cleaning device further comprises an outlet, in the stage, to supply cleaning fluid.

4. The apparatus according to claim 1, wherein the cleaning device comprises an optical element configured to supply radiation.

5. The apparatus of claim 1, wherein the cleaning device comprises an outlet, in the stage, to supply cleaning fluid.

6. The apparatus of claim 5, wherein the cleaning fluid comprises heptane, hexane, alcohol or acetone.

7. The apparatus of claim 1, comprising an outlet to rinse the space with ultra pure water after a cleaning using the cleaning device.

8. The apparatus of claim 1, wherein the liquid confinement structure has an outlet above the aperture to supply liquid to the space.

9. The apparatus of claim 1, wherein the cleaning device is in or at a substantially flat surface of the stage, the substantially flat surface having a width wider than the width of the aperture.

10. The apparatus of claim 1, wherein the liquid confinement structure comprises an outlet, outward of the aperture, configured to remove liquid and the apparatus is configured to control the stage to position the cleaning device to clean a bottom surface of the liquid confinement structure.

11. An exposure apparatus, comprising:

a projection system configured to project a beam of radiation onto a radiation-sensitive substrate;

a liquid confinement structure configured to at least partly confine a liquid in a space between the projection system and the substrate such that the liquid is in direct contact with the projection system and the liquid confinement structure, the liquid confinement structure having an outlet, extending around a path of the beam through the space, to remove liquid; and

a stage movable with respect to the liquid confinement structure, the stage having a width to cover an opening of the outlet and having a cleaning device configured to clean a surface of the projection system, of the liquid confinement structure, or of both the projection system and the liquid confinement structure.

12. The apparatus of claim 11, wherein the cleaning device comprises an ultrasonic emitter.

13. The apparatus of claim 11, wherein the cleaning device is in or at a substantially flat surface of the stage, the substantially flat surface having a width wider than the width of the outlet.

14. A device manufacturing method, comprising:

projecting a beam of radiation, using a projection system, onto a radiation-sensitive substrate;

at least partly confining a liquid in a space between the projection system and the substrate using a liquid confinement structure such that the liquid is in direct contact with the projection system and the liquid confinement structure, the liquid confinement structure having an aperture between the projection system and the substrate to allow passage of the beam of radiation through the liquid to an exposure field of the substrate;

moving a stage with respect to the liquid confinement structure, the stage having a width wider than a width of the aperture and the stage having a cleaning device; and

cleaning a surface of the projection system, of the liquid confinement structure, or of both the projection system and the liquid confinement structure, using the cleaning device.

15. The method of claim 14, wherein the cleaning device comprises an ultrasonic emitter and the cleaning comprising applying ultrasonic waves to a cleaning fluid.

16. The method of claim 15, wherein the cleaning further comprises supplying the cleaning fluid using an outlet in the stage.

17. The method of claim 14, wherein the cleaning further comprises supplying a cleaning fluid using an outlet in the stage.

18. The method of claim 17, wherein the cleaning fluid comprises heptane, hexane, alcohol or acetone.

19. The method of claim 14, wherein the cleaning comprises supplying radiation using an optical element of the stage.

20. The method of claim 14, wherein the cleaning device is in or at a substantially flat surface of the stage, the substantially flat surface having a width wider than the width of the outlet.