One-dimensional arrays of block copolymer cylinders and applications thereof

• US 8,642,157 B2
• Filed: 12/06/2011
• Issued: 02/04/2014
• Est. Priority Date: 02/13/2008
• Status: Active Grant

• Current Assignee: Micron Technology, Inc.
• Original Assignee: Micron Technology, Inc.
• Inventors: Millward, Dan B., Stuen, Karl
• Primary Examiner(s): CAIN, EDWARD J
• Application Number:
  US13/312,383
• Publication Number:
  US 20120076978A1
• Time in Patent Office: 791 Days
• Field of Search: 428/105, 428/113
• US Class Current: 428/105
• CPC Class Codes: B81C 1/00031 Regular or irregular arrays of nanoscale structures, e.g. etch mask layer photomechanical, e.g. photolithographic, production of textured or patterned surfaces G03F7/00; lithographic processes for making patterned surfaces using printing and stamping G03F7/0002
• CPC Class Codes: B81C 2201/0149 Forming nanoscale microstructures using auto-arranging or self-assembling material
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
• CPC Class Codes: H01L 21/0337 characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
• CPC Class Codes: H01L 21/0338 Process specially adapted to improve the resolution of the mask
• CPC Class Codes: H01L 21/31144 using masks
• CPC Class Codes: H01L 21/76816 Aspects relating to the layout of the pattern or to the size of vias or trenches layout of the interconnections per se H01L23/528; CAD of ICs G06F30/00
• CPC Class Codes: Y10S 977/778 within specified host or matrix material, e.g. nanocomposite films
• CPC Class Codes: Y10S 977/784 Electrically conducting, semi-conducting, or semi-insulating host material
• CPC Class Codes: Y10S 977/789 in array format
• CPC Class Codes: Y10S 977/79 with heterogeneous nanostructures
• CPC Class Codes: Y10T 428/24058 including grain, strips, or filamentary elements in respective layers or components in angular relation
• CPC Class Codes: Y10T 428/24124 Fibers
• CPC Class Codes: Y10T 428/24174 including sheet or component perpendicular to plane of web or sheet
• CPC Class Codes: Y10T 428/24182 Inward from edge of web or sheet

Abstract

Methods for fabricating sub-lithographic, nanoscale microstructures in one-dimensional arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.

Claims

1. A method of forming a polymer material, comprising:

annealing a block copolymer material situated within a trench in a substrate to form cylinders of a first block of the block copolymer within a matrix of a second block of the block copolymer, the trench having a length, opposing ends, sidewalls and a floor that are preferentially wetting to the first block of the block copolymer,

the annealed block copolymer material having a thickness, and the cylinders oriented perpendicular to and extending from the floor of the trench through the thickness of the annealed block copolymer material.

2. The method of claim 1, wherein the trench has a width of about 1 to about 1.5 times the L value of the block copolymer material.

3. The method of claim 2, wherein the cylinders are in a single row for the length of the trench.

4. The method of claim 1, wherein the width of the trench is about 1.75 to about 2.5 times the L value of the block copolymer material.

5. The method of claim 1, wherein the cylinders are in a zig-zag arrangement.

6. The method of claim 1, wherein the annealing comprises thermal annealing.

7. The method of claim 6, wherein the thermal annealing comprises globally heating the block copolymer material.

8. The method of claim 6, wherein the thermal annealing comprises passing a heat source across the block copolymer material to apply heat to a portion of the block copolymer material.

9. The method of claim 6, wherein the block copolymer comprises polystyrene and polylactide, and the block copolymer forms a bilayer of polylactide and polystyrene on the sidewalls, ends and floor of the trench.

10. The method of claim 1, wherein the annealing comprises solvent annealing.

11. The method of claim 10, wherein the solvent annealing is conducted in about 70% to 85% humidity.

12. The method of claim 10, wherein the solvent annealing comprises thermal annealing with a partial pressure of saturated solvent vapor.

13. The method of claim 1, wherein the block copolymer material is situated within a plurality of trenches and the ends of adjacent trenches are offset from each other.

14. The method of claim 13, wherein the ends of adjacent trenches are offset from each other by less than 5% of the L value of the block copolymer material.

15. A method of forming a polymer material, comprising:

thermally annealing a block copolymer material situated within a trench in a substrate to form cylinders of a first block of the block copolymer within a matrix of a second block of the block copolymer, the trench having a length, opposing ends and sidewalls that are preferentially wetting to the first block, and a neutral wetting floor,

the annealed block copolymer material having a thickness, and the cylinders oriented perpendicular to and extending from the neutral wetting floor of the trench through the thickness of the annealed block copolymer material in a single row for the length of the trench.

16. A method of forming a polymer material, comprising:

annealing a block copolymer material situated within a trench in a substrate to form cylinders of a first block of the block copolymer within a matrix of a second block of the block copolymer, the trench having a length, a floor, and opposing ends and sidewalls that are preferentially wetting to the first block of the block copolymer,

the annealed block copolymer material having a thickness, and the cylinders oriented perpendicular to and extending from the floor of the trench through the thickness of the annealed block copolymer material.

17. The method of claim 16, wherein the cylinders are in two rows for the length of the trench with adjacent cylinders offset from each other in a zig-zag arrangement.

18. The method of claim 17, wherein the adjacent cylinders are offset from each other at a center-to-center distance of about one-half the L value of the block copolymer material.

19. The method of claim 17, wherein the ends of the trench are angled.

20. A self-assembled block copolymer material situated within a trench in a material overlying a substrate, the trench having a length and a floor, sidewalls and ends that are preferential wetting to a first block of the block copolymer material, the block copolymer material comprising cylinders of the first block in a matrix of a second block of the block copolymer material, the cylinders oriented perpendicular to and extending from the floor of the trench through the thickness of the block copolymer material in a single row extending the length of the trench.

21. The block copolymer material of claim 20, wherein the block copolymer material is situated within a plurality of trenches with the ends of adjacent trenches being offset from each other.

22. The block copolymer material of claim 21, wherein the ends of adjacent trenches are offset from each other by less than 5% of the L value of the block copolymer material.

23. A self-assembled block copolymer material situated within a trench in a material overlying a substrate, the trench having a length, a floor that is neutral wetting, and sidewalls and ends that are preferential wetting to a first block of the block copolymer material, the block copolymer material comprising cylinders of the first block in a matrix of a second block of the block copolymer material, the cylinders oriented perpendicular to and extending from the trench floor through the thickness of the block copolymer material in a single row extending the length of the trench.

24. The block copolymer material of claim 23, wherein the block copolymer material is situated within a plurality of trenches with the ends of adjacent trenches being offset from each other.

25. A self-assembled block copolymer material situated within a trench in a material overlying a substrate, the trench having a length, the block copolymer material comprising cylinders of a first block in a matrix of a second block of the block copolymer material, the cylinders oriented perpendicular to and extending from the floor of the trench through the thickness of the block copolymer material in two rows for the length of the trench with adjacent cylinders offset from each other in a zig-zag arrangement.

26. The block copolymer material of claim 25, wherein the adjacent cylinders are offset from each other at a center-to-center distance of about one-half the L value of the block copolymer material.

27. The block copolymer material of claim 25, wherein the ends of the trench are angled.

28. The block copolymer material of claim 25, wherein the block copolymer material is situated within a plurality of trenches with the ends of adjacent trenches being offset from each other.