Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation
First Claim
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1. A charged particle beam system, comprising:
- a plasma source having;
a plasma chamber having a wall composed of a dielectric material, the wall having an interior surface and an exterior surface;
a conductor coiled at least one time around the plasma chamber;
a fluid surrounding and in thermal contact with at least a portion of the plasma chamber, the fluid being a liquid; and
a source electrode for electrically biasing the plasma to a high voltage; and
one or more focusing lenses for focusing charged particles from the plasma source onto a sample, the charged particle system lacking a pump for actively pumping the fluid around the portion of the plasma chamber, the fluid moving only by convection and/or gravity.
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Abstract
An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.
133 Citations
20 Claims
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1. A charged particle beam system, comprising:
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a plasma source having; a plasma chamber having a wall composed of a dielectric material, the wall having an interior surface and an exterior surface; a conductor coiled at least one time around the plasma chamber; a fluid surrounding and in thermal contact with at least a portion of the plasma chamber, the fluid being a liquid; and a source electrode for electrically biasing the plasma to a high voltage; and one or more focusing lenses for focusing charged particles from the plasma source onto a sample, the charged particle system lacking a pump for actively pumping the fluid around the portion of the plasma chamber, the fluid moving only by convection and/or gravity. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method of processing a sample, comprising:
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varying a voltage across an antenna to provide radio frequency energy into a plasma chamber; applying a high voltage to the plasma to bias the plasma relative to a work piece to be processes; conducting heat away from the plasma chamber using a liquid in contact with at least a portion of the plasma chamber, the liquid absorbing heat from the plasma chamber during operation moving only by convection and/or gravity and not being actively pumped in contact with the plasma chamber; extracting charged particles from a plasma chamber; and directing the charged particles toward the work piece to process or form an image of the work piece. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification