Apparatus of inspecting defect in semiconductor and method of the same
First Claim
Patent Images
1. A defect inspection apparatus comprising:
- an illumination unit for illuminating light to an object to be inspected,a detection unit for detecting scattered light from the object to be inspected, anda signal processing unit configured to;
detect a defect by comparing a detection signal of the scattered light detected by the detection unit and a predetermined first threshold,extract characteristic quantities of defects by comparing the detection signal and a predetermined second threshold which is lower than the first threshold,and classifying the defect using the extracted characteristic quantities.
0 Assignments
0 Petitions
Accused Products
Abstract
When size of a defect on an increasingly miniaturized pattern is obtained by defect inspection apparatus in the related art, a value is inconveniently given, which is different from a measured value of the same defect by SEM. Thus, a dimension value of a defect detected by defect inspection apparatus needs to be accurately calculated to be approximated to a value measured by SEM. To this end, size of the defect detected by the defect inspection apparatus is corrected depending on feature quantity or type of the defect, thereby defect size can be accurately calculated.
31 Citations
12 Claims
-
1. A defect inspection apparatus comprising:
-
an illumination unit for illuminating light to an object to be inspected, a detection unit for detecting scattered light from the object to be inspected, and a signal processing unit configured to; detect a defect by comparing a detection signal of the scattered light detected by the detection unit and a predetermined first threshold, extract characteristic quantities of defects by comparing the detection signal and a predetermined second threshold which is lower than the first threshold, and classifying the defect using the extracted characteristic quantities. - View Dependent Claims (2, 3, 4, 5, 6)
-
-
7. The defect inspection method comprising steps of:
-
illuminating light to an object to be inspected, detecting light scattered from the object to be inspected due to irradiation of the light, detecting a defect by comparing a detection signal of the scattered light and a predetermined first threshold using a signal processing unit, extracting characteristic quantities of defects by comparing the detection signal and a predetermined second threshold which is lower than the first threshold using the signal processing unit, classifying the defect using the extracted characteristic quantities. - View Dependent Claims (8, 9, 10, 11, 12)
-
Specification