Semiconductor device and method for manufacturing the same
First Claim
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1. A semiconductor device comprising:
- a first gate electrode over a substrate;
a first gate insulating layer comprising a first metal oxide film, over the first gate electrode;
an oxide semiconductor layer overlapping with the first gate electrode, over the first gate insulating layer;
a source electrode and a drain electrode over the oxide semiconductor layer;
a second gate insulating layer comprising a second metal oxide film, over the oxide semiconductor layer, the source electrode, and the drain electrode; and
a second gate electrode over the second gate insulating layer,wherein the first metal oxide film and the second metal oxide film are gallium oxide films.
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Abstract
An object is to manufacture a semiconductor device with high reliability by providing the semiconductor device including an oxide semiconductor with stable electric characteristics. In a transistor including an oxide semiconductor layer, a gallium oxide film is used for a gate insulating layer and made in contact with an oxide semiconductor layer. Further, gallium oxide films are provided so as to sandwich the oxide semiconductor layer, whereby reliability is increased. Furthermore, the gate insulating layer may have a stacked structure of a gallium oxide film and a hafnium oxide film.
141 Citations
22 Claims
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1. A semiconductor device comprising:
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a first gate electrode over a substrate; a first gate insulating layer comprising a first metal oxide film, over the first gate electrode; an oxide semiconductor layer overlapping with the first gate electrode, over the first gate insulating layer; a source electrode and a drain electrode over the oxide semiconductor layer; a second gate insulating layer comprising a second metal oxide film, over the oxide semiconductor layer, the source electrode, and the drain electrode; and a second gate electrode over the second gate insulating layer, wherein the first metal oxide film and the second metal oxide film are gallium oxide films. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A semiconductor device comprising:
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a first metal oxide film over a substrate; a source electrode and a drain electrode over the first metal oxide film; an oxide semiconductor layer over the first metal oxide film, the source electrode, and the drain electrode; a gate insulating layer comprising a second metal oxide film, over the oxide semiconductor layer; and a gate electrode which overlaps with the oxide semiconductor layer with the gate insulating layer interposed therebetween, wherein the first metal oxide film and the second metal oxide film are gallium oxide films. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A semiconductor device comprising:
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a first metal oxide film over a substrate; an oxide semiconductor layer over the first metal oxide film; a source electrode and a drain electrode over the oxide semiconductor layer; a gate insulating layer comprising a second metal oxide film, over the oxide semiconductor layer, the source electrode, and the drain electrode; and a gate electrode which overlaps with the oxide semiconductor layer with the gate insulating layer interposed therebetween, wherein the first metal oxide film and the second metal oxide film are gallium oxide films. - View Dependent Claims (17, 18, 19, 20, 21, 22)
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Specification