Nitride semiconductor laser element and method for manufacturing same
First Claim
Patent Images
1. A nitride semiconductor laser element comprising:
- a nitride semiconductor layer having cavity planes at ends of a waveguide region,an insulating film formed on an upper face of the nitride semiconductor layer so that ends of the insulating film on cavity plane sides are isolated from the cavity planes in plan view, anda first film formed from at least one of the cavity planes to an upper face of the nitride semiconductor layer, and covering part of a surface of the insulating film,the first film has a first region that is in contact with the nitride semiconductor and a second region that is in contact with the insulating film, and is formed from AlxGa1-xN (0<
x≦
1) and a different material from that of the insulating film.
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Abstract
A nitride semiconductor laser element has: a nitride semiconductor layer having cavity planes at the ends of a waveguide region, an insulating film formed on an upper face of the nitride semiconductor layer so that the ends on the cavity plane side are isolated from cavity planes, and a first film formed from the cavity plane to the upper face of the nitride semiconductor layer, and covered part of the insulating film surface, the first film has a first region that is in contact with the nitride semiconductor and a second region that is in contact with the insulating film, and is formed from AlxGa1-xN (0<x≦1) and a different material from that of the insulating film.
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15 Claims
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1. A nitride semiconductor laser element comprising:
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a nitride semiconductor layer having cavity planes at ends of a waveguide region, an insulating film formed on an upper face of the nitride semiconductor layer so that ends of the insulating film on cavity plane sides are isolated from the cavity planes in plan view, and a first film formed from at least one of the cavity planes to an upper face of the nitride semiconductor layer, and covering part of a surface of the insulating film, the first film has a first region that is in contact with the nitride semiconductor and a second region that is in contact with the insulating film, and is formed from AlxGa1-xN (0<
x≦
1) and a different material from that of the insulating film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification