Solution composition for forming oxide thin film and electronic device including the oxide thin film

• US 8,658,546 B2
• Filed: 10/12/2012
• Issued: 02/25/2014
• Est. Priority Date: 04/09/2009
• Status: Active Grant

• Current Assignee: Industry Academic Cooperation Foundation, Samsung Electronics Co. Ltd.
• Original Assignee: Industry Academic Cooperation Foundation, Samsung Electronics Co. Ltd.
• Inventors: Seon, Jong-Baek, Kim, Hyun-Jae, Lee, Sang-Yoon, Ryu, Myung-Kwan, Shin, Hyun-Soo, Park, Kyung-Bae, Jeong, Woong-Hee, Kim, Gun-hee, Ahn, Byung-Du
• Primary Examiner(s): Mandala, Michelle
• Application Number:
  US13/650,819
• Publication Number:
  US 20130036943A1
• Time in Patent Office: 501 Days
• Field of Search: 257/40, 257/79, 257/228, 257/431, 257/E51.005, 257/E51.022
• US Class Current: 438/786
• CPC Class Codes: H01L 29/7869 having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate

Abstract

A solution composition for forming an oxide thin film may include a first compound including zinc, a second compound including indium, and a third compound including magnesium or hafnium, and an electronic device may include an oxide semiconductor including zinc, indium, and magnesium. The zinc and hafnium may be included at an atomic ratio of about 1:0.01 to about 1:1.

Claims

1. A solution composition for forming an oxide thin film, comprising:

a first compound including zinc;

a second compound including indium; and

a third compound including hafnium,

wherein the zinc and hafnium are included at an atomic ratio of about 1;

0.01 to about 1;

1, and

wherein the first compound includes zinc acetate hydrate, the second compound includes indium nitrate hydrate, and the third compound includes hafnium chloride.

2. The solution composition of claim 1, wherein the zinc and hafnium are included at an atomic ratio of about 1:

0.05 to about 1;

0.3.

3. The solution composition of claim 1, further comprising:

at least one of an alcohol amine compound, ketone compound, an acid compound, a base compound, and deionized water.