Lateral connection for a via-less thin film resistor
First Claim
Patent Images
1. An integrated circuit, comprising:
- a substrate;
a first interconnect structure over the substrate, the first interconnect structure electrically connecting a first contact and a second contact spaced from each other on the substrate;
a second interconnect structure over the substrate spaced from the first interconnect structure, the second interconnect structure electrically connecting a third contact and a fourth contact spaced from each other on the substrate, each interconnect structure having a first conductive layer over the substrate and a second conductive layer over the first conductive layer, wherein the first and the second interconnect structures have a protective coating over the second conductive layer; and
a thin film resistor positioned over a portion of the substrate between the first and the second interconnect structures and abutting sidewalls of the first and second conductive layers of the first and second interconnect structures, the thin film resistor electrically connecting the first conductive layers of the first and second interconnect structures to each other, wherein the thin film resistor is over at least a portion of a top surface of the protective coating of the first and the second interconnect structures.
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Abstract
The present disclosure is directed to an integrated circuit having a substrate and a first and a second interconnect structure over the substrate. Each interconnect structure has a first conductive layer over the substrate and a second conductive layer over the first conductive layer. The integrated circuit also includes a thin film resistor over a portion of the substrate between the first and the second interconnect structure that electrically connects the first conductive layers of the first and second interconnect structures.
56 Citations
20 Claims
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1. An integrated circuit, comprising:
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a substrate; a first interconnect structure over the substrate, the first interconnect structure electrically connecting a first contact and a second contact spaced from each other on the substrate; a second interconnect structure over the substrate spaced from the first interconnect structure, the second interconnect structure electrically connecting a third contact and a fourth contact spaced from each other on the substrate, each interconnect structure having a first conductive layer over the substrate and a second conductive layer over the first conductive layer, wherein the first and the second interconnect structures have a protective coating over the second conductive layer; and a thin film resistor positioned over a portion of the substrate between the first and the second interconnect structures and abutting sidewalls of the first and second conductive layers of the first and second interconnect structures, the thin film resistor electrically connecting the first conductive layers of the first and second interconnect structures to each other, wherein the thin film resistor is over at least a portion of a top surface of the protective coating of the first and the second interconnect structures. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. An integrated circuit, comprising:
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a semiconductor substrate; a first interconnect structure over the semiconductor substrate, the first interconnect structure electrically connecting a first contact region and a second contact region spaced from each other on the semiconductor substrate; a second interconnect structure over the semiconductor substrate spaced from the first interconnect structure, the second interconnect structure electrically connecting a third contact region and a fourth contact region spaced from each other on the semiconductor substrate, each interconnect structure having a first conductive layer over the semiconductor substrate and a second conductive layer over the first conductive layer, wherein the first and the second interconnect structures have a protective coating over the second conductive layer; and a thin film resistor positioned over a portion of the semiconductor substrate between the first and the second interconnect structures and abutting sidewalls of the first and second conductive layers of the first and second interconnect structures, the thin film resistor electrically connecting the first conductive layers of the first and second interconnect structures to each other, wherein the thin film resistor is over at least a portion of a top surface of the protective coating of the first and the second interconnect structures. - View Dependent Claims (13, 14)
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15. An integrated circuit, comprising:
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a substrate; a first interconnect structure over the substrate, the first interconnect structure electrically connecting a first contact and a second contact spaced from each other on the substrate; a second interconnect structure over the substrate spaced from the first interconnect structure, the second interconnect structure electrically connecting a third contact and a fourth contact spaced from each other on the substrate, each interconnect structure having a first conductive layer over the substrate, a second conductive layer over the first conductive layer, and a protective coating over the second conductive layer; and a thin film resistor positioned over a portion of the substrate between the first and the second interconnect structures and over at least a portion of a top surface of the protective coating of the first and the second interconnect structures, the thin film resistor electrically connecting the first conductive layers of the first and second interconnect structures to each other. - View Dependent Claims (16, 17)
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18. An integrated circuit, comprising:
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a semiconductor substrate; a first interconnect structure over the semiconductor substrate, the first interconnect structure electrically connecting a first contact region and a second contact region spaced from each other on the semiconductor substrate; a second interconnect structure over the semiconductor substrate spaced from the first interconnect structure, the second interconnect structure electrically connecting a third contact region and a fourth contact region spaced from each other on the semiconductor substrate, each interconnect structure having a first conductive layer over the semiconductor substrate, a second conductive layer over the first conductive layer, a protective coating over the second conductive layer; and a thin film resistor positioned over a portion of the semiconductor substrate between the first and the second interconnect structures and over at least a portion of a top surface of the protective coating of the first and the second interconnect structures, the thin film resistor electrically connecting the first conductive layers of the first and second interconnect structures to each other. - View Dependent Claims (19, 20)
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Specification