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Multilayered infrared light reflective structure

  • US 8,659,822 B2
  • Filed: 12/22/2010
  • Issued: 02/25/2014
  • Est. Priority Date: 11/08/2010
  • Status: Active Grant
First Claim
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1. A multilayered infrared light reflective structure, comprising:

  • a transparent substrate;

    a doped oxide film disposed on the transparent substrate, wherein the doped oxide film comprises a lithium and fluorine co-doped tin oxide (Li—

    F;

    SnO2) film or a gallium-doped zinc oxide (Ga;

    ZnO2) film;

    an oxide isolated layer disposed on the doped oxide film, thereby allowing incident light to be incident from a top surface of the transparent substrate into the multilayered infrared light reflective structure, wherein the oxide isolated layer comprises a tungsten oxide (WO3-x) layer;

    an oxide distributed Bragg reflector film sandwiched between the doped oxide film and the oxide isolated layer, wherein the oxide distributed Bragg reflector film is formed by laminating a plurality of pairs of oxide films, and wherein each of the pairs of oxide films comprises a lower TiO2 film and an upper SiO2 film.

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