Multilayered infrared light reflective structure
First Claim
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1. A multilayered infrared light reflective structure, comprising:
- a transparent substrate;
a doped oxide film disposed on the transparent substrate, wherein the doped oxide film comprises a lithium and fluorine co-doped tin oxide (Li—
F;
SnO2) film or a gallium-doped zinc oxide (Ga;
ZnO2) film;
an oxide isolated layer disposed on the doped oxide film, thereby allowing incident light to be incident from a top surface of the transparent substrate into the multilayered infrared light reflective structure, wherein the oxide isolated layer comprises a tungsten oxide (WO3-x) layer;
an oxide distributed Bragg reflector film sandwiched between the doped oxide film and the oxide isolated layer, wherein the oxide distributed Bragg reflector film is formed by laminating a plurality of pairs of oxide films, and wherein each of the pairs of oxide films comprises a lower TiO2 film and an upper SiO2 film.
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Abstract
The invention provides a multilayered infrared light reflective structure. The multilayered infrared light reflective structure includes a transparent substrate. A doped oxide film is disposed on the transparent substrate. An oxide isolated layer is disposed on the doped oxide film, thereby allowing incident light to be incident from a top surface of the transparent substrate into the multilayered infrared light reflective structure.
25 Citations
7 Claims
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1. A multilayered infrared light reflective structure, comprising:
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a transparent substrate; a doped oxide film disposed on the transparent substrate, wherein the doped oxide film comprises a lithium and fluorine co-doped tin oxide (Li—
F;
SnO2) film or a gallium-doped zinc oxide (Ga;
ZnO2) film;an oxide isolated layer disposed on the doped oxide film, thereby allowing incident light to be incident from a top surface of the transparent substrate into the multilayered infrared light reflective structure, wherein the oxide isolated layer comprises a tungsten oxide (WO3-x) layer; an oxide distributed Bragg reflector film sandwiched between the doped oxide film and the oxide isolated layer, wherein the oxide distributed Bragg reflector film is formed by laminating a plurality of pairs of oxide films, and wherein each of the pairs of oxide films comprises a lower TiO2 film and an upper SiO2 film. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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Specification