Electrostatic chuck having a plurality of heater coils
First Claim
1. An electrostatic chuck for receiving a substrate in a process chamber, the chuck comprising:
- (a) a ceramic puck comprising (i) a substrate receiving surface having a plurality of raised plateaus defined by spaced apart mesas, the raised plateaus being distributed across the substrate receiving surface in a non-symmetrical pattern, (ii) an opposing backside surface, and (iii) central and peripheral portions;
(b) a plurality of heat transfer gas conduits traversing the ceramic puck and terminating in ports on the substrate receiving surface to provide heat transfer gas to the substrate receiving surface;
(c) an electrode embedded in the ceramic puck to generate an electrostatic force to retain a substrate placed on the substrate receiving surface; and
(d) a plurality of heater coils embedded in the ceramic puck, the heater coils being radially spaced apart and concentric to one another.
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Accused Products
Abstract
An electrostatic chuck for receiving a substrate in a substrate processing chamber comprises a ceramic puck having a substrate receiving surface having a plurality of spaced apart mesas, an opposing backside surface, and central and peripheral portions. A plurality of heat transfer gas conduits traverse the ceramic puck and terminate in ports on the substrate receiving surface to provide heat transfer gas to the substrate receiving surface. An electrode is embedded in the ceramic puck to generate an electrostatic force to retain a substrate placed on the substrate receiving surface. A plurality of heater coils are also embedded in the ceramic puck, the heaters being radially spaced apart and concentric to one another.
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Citations
20 Claims
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1. An electrostatic chuck for receiving a substrate in a process chamber, the chuck comprising:
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(a) a ceramic puck comprising (i) a substrate receiving surface having a plurality of raised plateaus defined by spaced apart mesas, the raised plateaus being distributed across the substrate receiving surface in a non-symmetrical pattern, (ii) an opposing backside surface, and (iii) central and peripheral portions; (b) a plurality of heat transfer gas conduits traversing the ceramic puck and terminating in ports on the substrate receiving surface to provide heat transfer gas to the substrate receiving surface; (c) an electrode embedded in the ceramic puck to generate an electrostatic force to retain a substrate placed on the substrate receiving surface; and (d) a plurality of heater coils embedded in the ceramic puck, the heater coils being radially spaced apart and concentric to one another. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. An electrostatic chuck for receiving a substrate in a process chamber, the chuck comprising:
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(a) a ceramic puck comprising a substrate receiving surface having a plurality of spaced apart mesas and an opposing backside surface comprising backside mesas; (b) a plurality of heat transfer gas conduits traversing the ceramic puck and terminating in ports on the substrate receiving surface to provide heat transfer gas to the substrate receiving surface; (c) an electrode embedded in the ceramic puck to generate an electrostatic force to retain a substrate placed on the substrate receiving surface; and (d) a plurality of heater coils embedded in the ceramic puck, the heater coils being radially spaced apart and concentric to one another. - View Dependent Claims (20)
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Specification