Cleanup method for optics in immersion lithography with cleaning liquid opposed by a surface of object
First Claim
1. A method used in an immersion lithography apparatus in which a wafer is exposed through an immersion liquid supplied via a nozzle member during a liquid immersion lithography process, the method comprising:
- placing a pad under a projection system for a cleanup process, the pad being different from the wafer and the cleanup process being performed separately from the immersion lithography process; and
supplying, during the cleanup process, a cleaning liquid onto a surface of the pad via the nozzle member, the cleaning liquid being different from the immersion liquid,wherein;
during the liquid immersion lithography process, a device pattern projection is performed, in which a device pattern image is projected by the projection system through the immersion liquid onto the wafer to fabricate semiconductor devices,during the cleanup process, the pad is disposed in place of the wafer and the pad is used without performing the device pattern projection,during the cleanup process, the pad is disposed directly vertically below the nozzle member from which the cleaning liquid is supplied onto the pad from above the pad, andthe wafer is disposed directly vertically below the nozzle member from which the immersion liquid is supplied onto the wafer from above the wafer during the liquid immersion lithography process.
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Abstract
An immersion lithography apparatus and a cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied from a liquid supply member to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided such that the surface of the object and the optical element are opposite to each other. During a cleanup process, a cleaning liquid is supplied from the liquid supply member onto the surface of the object.
298 Citations
11 Claims
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1. A method used in an immersion lithography apparatus in which a wafer is exposed through an immersion liquid supplied via a nozzle member during a liquid immersion lithography process, the method comprising:
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placing a pad under a projection system for a cleanup process, the pad being different from the wafer and the cleanup process being performed separately from the immersion lithography process; and supplying, during the cleanup process, a cleaning liquid onto a surface of the pad via the nozzle member, the cleaning liquid being different from the immersion liquid, wherein; during the liquid immersion lithography process, a device pattern projection is performed, in which a device pattern image is projected by the projection system through the immersion liquid onto the wafer to fabricate semiconductor devices, during the cleanup process, the pad is disposed in place of the wafer and the pad is used without performing the device pattern projection, during the cleanup process, the pad is disposed directly vertically below the nozzle member from which the cleaning liquid is supplied onto the pad from above the pad, and the wafer is disposed directly vertically below the nozzle member from which the immersion liquid is supplied onto the wafer from above the wafer during the liquid immersion lithography process. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method used in an immersion lithography apparatus in which a wafer is exposed through an immersion liquid supplied via a nozzle member during a liquid immersion lithography process, the method comprising:
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placing a pad under the nozzle member for a cleanup process, the pad being different from the wafer and the cleanup process being performed separately from the immersion lithography process; and supplying, during the cleanup process, a cleaning liquid via the nozzle member onto a surface of the pad, the cleaning liquid being different from the immersion liquid, wherein during the cleanup process, the pad is disposed directly vertically below the nozzle member from which the cleaning liquid is supplied onto the pad from above the pad, and the wafer is disposed directly vertically below the nozzle member from which the immersion liquid is supplied onto the wafer from above the wafer during the liquid immersion lithography process. - View Dependent Claims (8, 9, 10, 11)
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Specification