Optical imaging writer system
First Claim
1. A method for applying mask data patterns to substrate in a lithography manufacturing process, comprising:
- providing a parallel imaging writer system, wherein the parallel imaging writer system includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, wherein each one of the plurality of SLM imaging units includes a plurality of illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the plurality of illumination sources to the corresponding one or more projection lens, and wherein the plurality of illumination sources include a plurality of actinic illumination sources configured to write a mask data pattern to a substrate and a non-actinic illumination source configured to adjust focus of the one of the plurality of SLM imaging units to an area of the substrate, wherein the non-actinic illumination source is located at a center of the plurality of illumination sources;
receiving the mask data pattern to be written to the substrate;
processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate;
assigning one or more SLM imaging units to handle each of the partitioned mask data pattern;
controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel;
controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate; and
controlling movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns.
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Accused Products
Abstract
System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays; receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel, controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate, and controlling movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns.
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Citations
24 Claims
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1. A method for applying mask data patterns to substrate in a lithography manufacturing process, comprising:
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providing a parallel imaging writer system, wherein the parallel imaging writer system includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, wherein each one of the plurality of SLM imaging units includes a plurality of illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the plurality of illumination sources to the corresponding one or more projection lens, and wherein the plurality of illumination sources include a plurality of actinic illumination sources configured to write a mask data pattern to a substrate and a non-actinic illumination source configured to adjust focus of the one of the plurality of SLM imaging units to an area of the substrate, wherein the non-actinic illumination source is located at a center of the plurality of illumination sources; receiving the mask data pattern to be written to the substrate; processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate; assigning one or more SLM imaging units to handle each of the partitioned mask data pattern; controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel; controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate; and controlling movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A parallel imaging writer system, comprising:
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a plurality of spatial light modulator (SLM) imaging units, wherein each one of the plurality of SLM imaging units includes a plurality of illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the plurality of illumination sources to the corresponding one or more projection lens, and wherein the plurality of illumination sources include a plurality of actinic illumination sources configured to write a mask data pattern to a substrate and a non-actinic illumination source configured to adjust focus of the one of the plurality of SLM imaging units to an area of the substrate, wherein the non-actinic illumination source is located at a center of the plurality of illumination sources; and a controller configured to control the plurality of SLM imaging units, wherein the controller includes logic configured to receive the mask data pattern to be written to the substrate; logic configured to process the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate; logic configured to assign one or more SLM imaging units to handle each of the partitioned mask data pattern; logic configured to control the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel; logic configured to control movement of the plurality of SLM imaging units to cover the different areas of the substrate; and logic configured to control movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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Specification