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Optical imaging writer system

  • US 8,670,106 B2
  • Filed: 05/29/2009
  • Issued: 03/11/2014
  • Est. Priority Date: 09/23/2008
  • Status: Active Grant
First Claim
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1. A method for applying mask data patterns to substrate in a lithography manufacturing process, comprising:

  • providing a parallel imaging writer system, wherein the parallel imaging writer system includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, wherein each one of the plurality of SLM imaging units includes a plurality of illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the plurality of illumination sources to the corresponding one or more projection lens, and wherein the plurality of illumination sources include a plurality of actinic illumination sources configured to write a mask data pattern to a substrate and a non-actinic illumination source configured to adjust focus of the one of the plurality of SLM imaging units to an area of the substrate, wherein the non-actinic illumination source is located at a center of the plurality of illumination sources;

    receiving the mask data pattern to be written to the substrate;

    processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate;

    assigning one or more SLM imaging units to handle each of the partitioned mask data pattern;

    controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel;

    controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate; and

    controlling movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns.

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