Methods of forming FinFET devices with alternative channel materials
First Claim
1. A method of forming a FinFET device, comprising:
- providing a substrate comprised of a first semiconductor material;
performing a first epitaxial deposition process to form a layer of a second semiconductor material above said substrate;
forming a patterned hard mask layer above said layer of second semiconductor material;
performing a first etching process through said patterned hard mask layer to define a plurality of spaced-apart trenches that define first and second portions of a fin for said FinFET device, said first portion being comprised of said first semiconductor material, said second portion being comprised of said second semiconductor material;
forming a layer of insulating material in said trenches, said layer of insulating material overfilling said trenches and said patterned hard mask layer;
performing a planarization process on said layer of insulating material that exposes said patterned hard mask layer positioned above said second portion of said fin;
performing at least one second etching process to remove said patterned hard mask layer positioned above said second portion of said fin to thereby expose an upper surface of said second portion of said fin;
performing at least one third etching process to reduce a thickness of said second portion of said fin and thereby define a cavity within said layer of insulating material above said second portion of said fin;
performing a second epitaxial deposition process to form a third portion of said fin on said second portion of said fin within said cavity, said third portion of said fin being comprised of a third semiconductor material that is different than said second semiconductor material; and
performing a fourth etching process on said layer of insulating material such that a post-etch upper surface of said layer of insulating material after performing said fourth etching process is performed is below an upper surface of said third portion of said fin.
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Accused Products
Abstract
One method involves providing a substrate comprised of first and second semiconductor materials, performing an etching process through a hard mask layer to define a plurality of trenches that define first and second portions of a fin for a FinFET device, wherein the first portion is the first material and the second portion is the second material, forming a layer of insulating material in the trenches, performing a planarization process on the insulating material, performing etching processes to remove the hard mask layer and reduce a thickness of the second portion, thereby defining a cavity, performing a deposition process to form a third portion of the fin on the second portion, wherein the third portion is a third semiconducting material that is different from the second material, and performing a process such that a post-etch upper surface of the insulating material is below an upper surface of the third portion.
38 Citations
16 Claims
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1. A method of forming a FinFET device, comprising:
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providing a substrate comprised of a first semiconductor material; performing a first epitaxial deposition process to form a layer of a second semiconductor material above said substrate; forming a patterned hard mask layer above said layer of second semiconductor material; performing a first etching process through said patterned hard mask layer to define a plurality of spaced-apart trenches that define first and second portions of a fin for said FinFET device, said first portion being comprised of said first semiconductor material, said second portion being comprised of said second semiconductor material; forming a layer of insulating material in said trenches, said layer of insulating material overfilling said trenches and said patterned hard mask layer; performing a planarization process on said layer of insulating material that exposes said patterned hard mask layer positioned above said second portion of said fin; performing at least one second etching process to remove said patterned hard mask layer positioned above said second portion of said fin to thereby expose an upper surface of said second portion of said fin; performing at least one third etching process to reduce a thickness of said second portion of said fin and thereby define a cavity within said layer of insulating material above said second portion of said fin; performing a second epitaxial deposition process to form a third portion of said fin on said second portion of said fin within said cavity, said third portion of said fin being comprised of a third semiconductor material that is different than said second semiconductor material; and performing a fourth etching process on said layer of insulating material such that a post-etch upper surface of said layer of insulating material after performing said fourth etching process is performed is below an upper surface of said third portion of said fin. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of forming a FinFET device, comprising:
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providing a substrate comprised of a first semiconductor material; performing a first epitaxial deposition process to form a layer of a second semiconductor material above said substrate, said second semiconductor material being different than said first semiconductor material; forming a patterned hard mask layer above said layer of said second semiconductor material; performing a first etching process through said patterned hard mask layer to define a plurality of spaced-apart trenches that define first and second portions of a fin for said FinFET device, said first portion being comprised of said first semiconductor material, said second portion being comprised of said second semiconductor material; forming a layer of insulating material in said trenches, said layer of insulating material overfilling said trenches and said patterned hard mask layer; performing a planarization process on said layer of insulating material that exposes said patterned hard mask layer positioned above said second portion of said fin; performing at least one second etching process to remove said patterned hard mask layer positioned above said second portion of said fin to thereby expose an upper surface of said second portion of said fin; performing at least one third etching process to reduce a thickness of said second portion of said fin and thereby define a cavity within said layer of insulating material above said second portion of said fin; performing a second epitaxial deposition process to form a third portion of said fin on said second portion of said fin within said cavity, said third portion of said fin being comprised of a third semiconductor material that is different than both of said first and second semiconductor materials; and performing a fourth etching process on said layer of insulating material such that a post-etch upper surface of said layer of insulating material after performing said fourth etching process is performed is below an upper surface of said third portion of said fin. - View Dependent Claims (11, 12, 13, 14, 15, 16)
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Specification