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Fine tuning highly resistive substrate resistivity and structures thereof

  • US 8,679,863 B2
  • Filed: 03/15/2012
  • Issued: 03/25/2014
  • Est. Priority Date: 03/15/2012
  • Status: Active Grant
First Claim
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1. A method comprising:

  • performing back end of the line (BEOL) processes on a substrate;

    measuring a first resistivity of the substrate after performing an annealing process of the BEOL processes;

    continuing to perform the BEOL processes on the substrate after the measuring the first resistivity;

    measuring a second resistivity of the substrate after performing a subsequent annealing process of the continued BEOL processes;

    determining whether the second resistivity of the substrate is at a target resistivity; and

    when the second resistivity is not at the target resistivity, fine tuning a final annealing process to achieve the target resistivity by extrapolating correlation data of historical substrates with known resistivities after annealing processes to a resistivity change between the first resistivity and the second resistivity.

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