Semiconductor device and method for manufacturing the same
First Claim
1. A semiconductor device comprising:
- a first gate electrode;
a first insulating layer over the first gate electrode;
an oxide semiconductor layer over the first insulating layer, the oxide semiconductor layer including a crystal with c-axis alignment;
a second insulating layer over the oxide semiconductor layer, the second insulating layer including a first region and a second region thicker than the first region;
a second gate electrode over the second insulating layer; and
a pixel electrode over the second insulating layer,wherein the first region overlaps with the first gate electrode, the oxide semiconductor layer, and the second gate electrode,wherein the second region overlaps with the pixel electrode, andwherein the second gate electrode is separated from the pixel electrode.
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Abstract
A semiconductor device includes a pixel electrode and a transistor which includes a first gate electrode, a first insulating layer over the first gate electrode, a semiconductor layer over the first insulating layer, a second insulating layer over the semiconductor layer, and a second gate electrode. The pixel electrode and the second gate electrode are provided over the second insulating layer. The first gate electrode has a region overlapping with the semiconductor layer with the first insulating layer provided therebetween. The second gate electrode has a region overlapping with the semiconductor layer with the second insulating layer provided therebetween. A first region is at least part of a region where the second gate electrode overlaps with the semiconductor layer. A second region is at least part of a region where the pixel electrode is provided. The second insulating layer is thinner in the first region than in the second region.
137 Citations
24 Claims
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1. A semiconductor device comprising:
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a first gate electrode; a first insulating layer over the first gate electrode; an oxide semiconductor layer over the first insulating layer, the oxide semiconductor layer including a crystal with c-axis alignment; a second insulating layer over the oxide semiconductor layer, the second insulating layer including a first region and a second region thicker than the first region; a second gate electrode over the second insulating layer; and a pixel electrode over the second insulating layer, wherein the first region overlaps with the first gate electrode, the oxide semiconductor layer, and the second gate electrode, wherein the second region overlaps with the pixel electrode, and wherein the second gate electrode is separated from the pixel electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 21, 22)
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9. A semiconductor device comprising:
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a transistor including; a first gate electrode; a first insulating layer over the first gate electrode; an oxide semiconductor layer over the first insulating layer, the oxide semiconductor layer including a crystal with c-axis alignment; a second insulating layer over the oxide semiconductor layer, and a second gate electrode over the second insulating layer, wherein the first gate electrode comprises a region overlapping with the oxide semiconductor layer with the first insulating layer provided therebetween, and wherein the second gate electrode comprises a region overlapping with the oxide semiconductor layer with the second insulating layer provided therebetween; and a pixel electrode over the second insulating layer, wherein at least part of a region where the second gate electrode at least partly overlaps with at least part of the oxide semiconductor layer with part of the second insulating layer interposed therebetween is included in a first region, wherein at least part of a region where the pixel electrode is provided over part of the second insulating layer is included in a second region, wherein the second insulating layer is thinner in the first region than in the second region, and wherein the second gate electrode is separated from the pixel electrode. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 23, 24)
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17. A method for manufacturing a semiconductor device, comprising the steps of:
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forming a first gate electrode over an insulating surface; forming a first insulating layer over the first gate electrode; forming an oxide semiconductor layer over the first insulating layer; forming a second insulating layer including a first region and a second region thicker than the first region over the oxide semiconductor layer; forming a conductive layer over the second insulating layer; etching the conductive layer so that a second gate electrode and a pixel electrode are formed over the second insulating layer, wherein the oxide semiconductor layer includes a crystal with c-axis alignment, wherein the oxide semiconductor layer at least partly overlaps with at least part of the first gate electrode with the first insulating layer provided therebetween, wherein the second gate electrode overlaps with at least part of the oxide semiconductor layer with the first region provided therebetween, wherein the pixel electrode overlaps with at least part of the second region, and wherein the second gate electrode is separated from the pixel electrode. - View Dependent Claims (18, 19, 20)
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Specification