Method and system for feed-forward advanced process control
First Claim
1. A method of forming a new integrated circuit design on a semiconductor wafer using a photolithography tool, the method comprising:
- selecting a previously processed wafer having a past integrated circuit design, wherein the past integrated circuit design is different than the new integrated circuit design;
selecting a plurality of critical dimension (CD) data points extracted from the previously processed wafer after the previously processed wafer was etched, the plurality of CD data points having a first average CD;
creating a field layout and associated baseline exposure dose map for the new integrated circuit design, each field in the field layout having a second average CD;
refining each field in the baseline exposure dose map based on a difference between the first average CD for the previously processed wafer and the second average CD for each field in the field layout; and
controlling the exposure of the photolithography tool according to the refined baseline exposure dose map to form the new integrated circuit design on the semiconductor wafer.
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Abstract
Embodiments of the present disclosure disclose a method of forming a new integrated circuit design on a semiconductor wafer using a photolithography tool. The method includes selecting a previously processed wafer having a past integrated circuit design different than the new integrated circuit design, selecting a plurality of critical dimension (CD) data points extracted from the previously processed wafer after the previously processed wafer was etched, and creating a field layout and associated baseline exposure dose map for the new integrated circuit design. The method also includes refining each field in the baseline exposure dose map based on a difference between an average CD for the previously processed wafer and an average CD for each field in the field layout and controlling the exposure of the photolithography tool according to the refined baseline exposure dose map to form the new integrated circuit design on the semiconductor wafer.
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Citations
19 Claims
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1. A method of forming a new integrated circuit design on a semiconductor wafer using a photolithography tool, the method comprising:
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selecting a previously processed wafer having a past integrated circuit design, wherein the past integrated circuit design is different than the new integrated circuit design; selecting a plurality of critical dimension (CD) data points extracted from the previously processed wafer after the previously processed wafer was etched, the plurality of CD data points having a first average CD; creating a field layout and associated baseline exposure dose map for the new integrated circuit design, each field in the field layout having a second average CD; refining each field in the baseline exposure dose map based on a difference between the first average CD for the previously processed wafer and the second average CD for each field in the field layout; and controlling the exposure of the photolithography tool according to the refined baseline exposure dose map to form the new integrated circuit design on the semiconductor wafer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An advanced process control (APC) system for forming a new integrated circuit design on a semiconductor wafer with a semiconductor processing tool, the system comprising:
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a database operable to store historical data about processed wafers; and a controller operable to control the semiconductor processing tool based on a plurality of instructions stored in a non-transitory, computer-readable memory, the plurality of instructions including instructions that; select, from the historical data, a processed wafer having a past integrated circuit design, wherein the past integrated circuit design is different than the new integrated circuit design; select a plurality of critical dimension (CD) data points extracted from the processed wafer after the processed wafer was etched, the plurality of CD data points having a first average CD; create a field layout and associated baseline exposure dose map for the new integrated circuit design, each field in the field layout having a second average CD; refine each field in the baseline exposure dose map based on a difference between the first average CD for the processed wafer and the second average CD for each field in the field layout; and control the exposure of the semiconductor processing tool according to the refined baseline exposure dose map to form the new integrated circuit design on the semiconductor wafer. - View Dependent Claims (12, 13, 14, 15, 16, 17)
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18. A method of forming a new integrated circuit design on a semiconductor wafer using a photolithography tool, the method comprising:
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selecting a previously processed wafer having a past integrated circuit design, the past integrated circuit design being different than the new integrated circuit design, and the previously processed wafer having a plurality of critical dimension (CD) data points extracted therefrom after being etched, the plurality of CD data points having a first average CD; selecting a subset of the plurality of critical dimension (CD) data points by grouping fields on the processed wafer into a plurality of groups and selecting CD data points from a plurality of fields in each of the plurality of groups; creating an initial exposure dose map for the new integrated circuit design using the subset of the plurality of CD data points, wherein creating the initial exposure dose map includes; creating a field layout and associated baseline exposure dose map for the new integrated circuit design, each field in the field layout having a second average CD; and refining each field in the baseline exposure dose map based on a difference between the first average CD for the previously processed wafer and the second average CD for each field in the field layout; and controlling the exposure of the photolithography tool according to the initial exposure dose map to form the new integrated circuit design on the semiconductor wafer. - View Dependent Claims (19)
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Specification