Operation monitoring system for processing apparatus

• US 8,688,246 B2
• Filed: 07/21/2009
• Issued: 04/01/2014
• Est. Priority Date: 07/24/2008
• Status: Active Grant

• Current Assignee: Ulvac Incorporated
• Original Assignee: Ulvac Incorporated
• Inventors: Fujii, Yoshinori
• Primary Examiner(s): Bahta, Kidest
• Application Number:
  US13/054,107
• Publication Number:
  US 20110125331A1
• Time in Patent Office: 1,715 Days
• Field of Search: 700/45, 700/56, 700/21, 735/79, 736/02, 340/683
• US Class Current: 700/45
• CPC Class Codes: H01L 21/67253 Process monitoring, e.g. flow or thickness monitoring
• CPC Class Codes: H01L 21/67288 Monitoring of warpage, curvature, damage, defects or the like
• CPC Class Codes: H01L 21/67742 Mechanical parts of transfer devices robots in general in B25J

Abstract

In a processing apparatus having: moveable parts disposed to form a predetermined processing environment within a processing chamber in which a predetermined processing is performed on an object to be processed; and a control means for controlling the operation of each of the moveable parts, abnormality inclusive of deterioration with time of the moveable parts constituting the processing apparatus is made to be easily judged. There is provided a vibration detection means for detecting the waveforms of vibrations that occur accompanied by the operation of the moveable parts. When control is made from the control means in order to operate any one of the moveable parts, there are obtained event data corresponding to the control and the waveforms of vibrations of all the moveable parts that are operating simultaneously at the time in question. Each time the control corresponding to the event data is selected, or when a waveform of vibration corresponding to another event data of the same kind as that of the above-mentioned event data has been obtained, the change in the waveform is monitored. When the waveform has changed beyond a predetermined range, the processing apparatus is judged to be abnormal.

Claims

1. An operation monitoring system for a processing apparatus, the processing apparatus comprising:

moveable parts disposed to form a predetermined processing environment within a processing chamber in which a predetermined processing is performed on an object to be processed; and

a control means for controlling the operation of each of the moveable parts,

the operation monitoring system having a vibration detection means for detecting waveforms of vibrations to be generated accompanied by the operation of the moveable parts,

wherein, when control by the control means is performed to operate any one of the moveable parts, there are obtained;

event data corresponding to the control; and

waveforms of vibrations of all the moveable parts that are detected by the vibration detection means and that are moving simultaneously, and

only when any one of the movable parts corresponding to the event data is operated, the change in the waveform is monitored and, if the waveform has changed beyond a predetermined range, the processing apparatus is judged to be abnormal.

2. The operation monitoring system for a processing apparatus according to claim 1, wherein in case the control corresponding to the event data is selected and when another waveform of vibration that is not included in the previous waveforms of vibrations is newly detected, a cause for generation of the newly detected vibration is identified and said another waveform based on the cause for generation of vibration is stored in memory, and

in case said another waveform is detected by the vibration detection means during the operation of any one of the moveable parts, a judgment is made that the processing apparatus is abnormal.

3. The operation monitoring system for a processing apparatus according to claim 1, wherein the obtained waveform of vibration is stored in memory after conversion to predetermined characteristics parameters along with the event data.

4. The operation monitoring system for a processing apparatus according to claim 3, further comprising a display means for displaying the characteristics parameters.

5. The operation monitoring system for a processing apparatus according to claim 1, wherein the vibration detection means is made up of a combination of a plurality of sensors having different frequency bands of measurable vibrations.

6. The operation monitoring system for a processing apparatus according to claim 2, wherein the obtained waveform of vibration is stored in memory after conversion to predetermined characteristics parameters.

7. The operation monitoring system for a processing apparatus according to claim 6, further comprising a display means for displaying the characteristics parameters.

8. The operation monitoring system for a processing apparatus according to claim 2, wherein the vibration detection means is made up of a combination of a plurality of sensors having different frequency bands of measurable vibrations.

9. The operation monitoring system for a processing apparatus according to claim 3, wherein the vibration detection means is made up of a combination of a plurality of sensors having different frequency bands of measurable vibrations.

10. The operation monitoring system for a processing apparatus according to claim 6, wherein the vibration detection means is made up of a combination of a plurality of sensors having different frequency bands of measurable vibrations.

11. The operation monitoring system for a processing apparatus according to claim 4, wherein the vibration detection means is made up of a combination of a plurality of sensors having different frequency bands of measurable vibrations.

12. The operation monitoring system for a processing apparatus according to claim 7, wherein the vibration detection means is made up of a combination of a plurality of sensors having different frequency bands of measurable vibrations.