Lithographic apparatus and device manufacturing method using pupil filling by telecentricity control

• US 8,692,974 B2
• Filed: 06/14/2007
• Issued: 04/08/2014
• Est. Priority Date: 06/14/2007
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Baselmans, Johannes Jacobus Matheus
• Primary Examiner(s): Ton, Toan
• Assistant Examiner(s): RIDDLE, CHRISTINA A
• Application Number:
  US11/763,274
• Publication Number:
  US 20080309898A1
• Time in Patent Office: 2,490 Days
• Field of Search: 355/52, 355/55, 355 67- 71, 355/53, 355/77, 359/299, 359/302, 359/315, 359/316, 359/318, 359/223.1, 359/225.1, 359/291, 359/290, 359/792.1, 359/492.2, 359/492.22, 430/5, 430/8, 430/30, 430/311, 356/520, 356/521
• US Class Current: 355/52
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/706 Aberration measurement
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

A method of measuring aberration present in a lithographic apparatus comprising the following steps. Modulating a radiation beam using a reflective patterning device. Projecting the radiation beam using a projection system. Detecting the projected radiation using a sensor. Measuring aberration via interference in the detected radiation beam. The radiation beam is tilted away from the optical axis of the projection system prior to entering the projection system.

Claims

1. A method of measuring aberration present in a lithographic apparatus, comprising:

modulating a radiation beam using a reflective patterning device;

projecting the modulated radiation beam in a plurality of overlapping adjacent areas using a projection system;

detecting the projected radiation beam using a sensor; and

measuring an aberration via interference in the detected radiation beam;

wherein the modulated radiation beam, as a whole, is tilted, by an optical component positioned along an optical axis of the projection system, to a plurality of different positions with respect to the optical axis of the projection system prior to entering the projection system, and

wherein the combination of the plurality of different positions of the modulated radiation beam fills an entrance pupil of the projection system.

2. The method of claim 1, wherein the modulated radiation beam, as a whole, is tilted such that the modulated radiation beam overlaps an edge of the entrance pupil of the projection system.

3. The method of claim 1, wherein aberration is measured with the modulated radiation beam, as a whole, tilted to a first position with respect to the optical axis, and is then subsequently measured with the modulated radiation beam, as a whole, tilted to a second position with respect to the optical axis.

4. The method of claim 3, wherein, if different aberration measurements are obtained for a given location of the lithography apparatus, an average of the measurements is determined.

5. The method of claim 1, wherein the plurality of overlapping adjacent areas comprise quadrants of the entrance pupil.

6. The method of claim 1, wherein the modulated radiation beam is tilted by tilting the reflective patterning device as a whole.

7. The method of claim 1, wherein the optical component forms part of an illumination system of the lithographic apparatus.

8. The method of claim 1, wherein the reflective patterning device is a reflective mask or an array of individually controllable elements.

9. A lithographic apparatus, comprising:

a reflective patterning device configured to modulate a beam of radiation;

a projection system configured to project the modulated beam of radiation in a plurality overlapping adjacent areas; and

a sensor arranged to detect interference in the radiation projected by the projection system;

wherein the reflective patterning device is positioned along an optical axis of the projection system and configured to be rotatable transverse to its optical axis, the rotation being arranged to tilt the modulated radiation beam, as a whole, away from the optical axis of the projection system prior to entering the projection system,

wherein the range of rotational movement of the reflective patterning device is sufficient that the modulated radiation beam, as a whole, is moved to a plurality of different positions, away from the optical axis of the projection system, at an entrance pupil of the projection system, such that the combination of different positions fills the entrance pupil of the projection system.

10. The lithographic apparatus of claim 9, wherein the range of rotational movement of the reflective patterning device is sufficient that the modulated radiation beam overlaps an edge of the entrance pupil of the projection system.

11. The lithographic apparatus of claim 9, wherein the reflective patterning device is a reflective mask or an array of individually controllable elements.

12. The apparatus of claim 9, wherein the plurality of overlapping adjacent areas comprise quadrants of the entrance pupil.

13. A lithographic apparatus, comprising:

a reflective patterning device configured to modulate a beam of radiation;

a projection system configured to project the modulated beam of radiation in a plurality of overlapping adjacent areas; and

a sensor arranged to detect interference in the radiation projected by the projection system;

wherein the lithographic apparatus further comprises a moveable optical component positioned along an optical axis of the projection system and arranged to tilt the radiation beam, as a whole, away from the optical axis, prior to the radiation beam being incident upon the reflective patterning device,

wherein the range of rotational movement of the optical component is sufficient that the radiation beam, as a whole, is moved to as plurality of different positions at the entrance pupil of the projection system, such that the combination of different positions fills the entrance pupil of the projection system.

14. The lithographic apparatus of claim 13, wherein the optical component is a rotatable mirror.

15. The lithographic apparatus of claim 13, wherein the moveable optical component forms part of an illumination system of the lithographic apparatus.

16. The lithographic apparatus of claim 13, wherein the range of movement of the optical component is sufficient that the radiation beam overlaps an edge of an entrance pupil of the projection system.

17. The apparatus of claim 13, wherein the plurality of overlapping adjacent areas comprise quadrants of the entrance pupil.

18. A method of measuring transmission of a projection system of a lithographic apparatus as a function of angle, comprising:

reflecting a radiation beam using a reflective patterning device;

projecting the reflected radiation beam in a plurality of overlapping adjacent quadrant areas using a projection system; and

measuring the intensity of projected radiation using a sensor;

wherein a plurality of intensity measurements are obtained with the reflected radiation beam, as a whole, tilted, by an optical component positioned along an optical axis of the projection system, in a corresponding plurality of different directions, away from the optical axis of the projection system, prior to entering the projection system, and

wherein the combination of the plurality of different directions cause the reflected radiation to fill an entrance pupil of the projection system.

19. The method of claim 18, wherein an apodization of the projection system or a numerical aperture of the projection system is measured.