Inspection method and apparatus, and associated computer readable product

• US 8,692,994 B2
• Filed: 02/23/2011
• Issued: 04/08/2014
• Est. Priority Date: 03/18/2010
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Straaijer, Alexander
• Primary Examiner(s): Toatley, Gregory J
• Assistant Examiner(s): BOLOGNA, DOMINIC JOSEPH
• Application Number:
  US13/033,135
• Publication Number:
  US 20120044495A1
• Time in Patent Office: 1,140 Days
• Field of Search: 356364-370
• US Class Current: 356/369
• CPC Class Codes: G03F 7/70625 Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness

Abstract

A system is configured to measure two separately polarized beams upon diffraction from a substrate in order to determine properties of a grating on a substrate. Linearly polarized light sources are passed via a fixed phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The relative phases of the two radiation beams and other features of the beams as measured in a detector gives rise to properties of the substrate surface. The grating and the initial linear polarization of the radiation beam are angled non-orthogonally relative to each other.

Claims

1. A method comprising:

providing a radiation beam with linear polarization;

reflecting the linearly polarized radiation beam off a grating on a substrate at a range of incident and azimuth angles;

introducing a phase shift, by a phase shifter, to the linearly polarized radiation beam thereby altering its polarization to elliptical;

splitting, by a beam splitter, the reflected radiation beam into first and second orthogonally polarized sub-beams;

adjusting at least one of the linearly polarized radiation beam, the grating on the substrate, the phase shifter, and the beam splitter to enable sensitivity to multiple polarization angles and sensitivity to detection of at least one of critical dimension, sidewall angle, and thickness;

shifting a phase of the first sub-beam by a fixed amount with respect to the second sub-beam; and

simultaneously detecting, by a detector, an angle-resolved spectrum of both sub-beams;

wherein the grating and the initial linear polarization of the radiation beam are angled non-orthogonally relative to each other.

2. The method of claim 1, wherein the angle between the grating and the initial linear polarization of the radiation beam is approximately 45, 135, 225, or 315 degrees.

3. The method of claim 1, wherein the initial linear polarization of the radiation beam is parallel to a major axis of a system used, the grating being angled accordingly during measurement.

4. The method of claim 1, wherein the grating is measured when aligned parallel to a major axis of a system used, the initial linear polarization of the radiation beam being at a non-orthogonal angle thereto.

5. The method of claim 1, further comprising:

measuring an azimuth angle (A) of the radiation beam;

detecting an intensity (m) of the first and second sub-beams;

deriving a reflectance of the first and second sub-beams (Rp, Rs) from the azimuth angle (A) and the intensity (m);

evaluating an angle (P) between the two polarization directions of the two sub-beams; and

determining a property of the surface of the substrate resulting from a variation from a predetermined model of the angle (P) between the two polarization directions of the two sub-beams.

6. The method of claim 5, wherein:

the reflectance of the first and second sub-beams (Rp, Rs) is derived with the following equation;

m=0.5(Rp²+Rs²)+0.5 cos(2A)(Rp²−

Rs²); and

the angle (ψ

) between the two polarization directions of the two sub-beams is evaluated using the following equation;

tan ψ

=Rp/Rs.

7. The method of claim 1, wherein the phase shifter comprises a quarter-wave plate, the method further comprising:

determining the phase shift introduced by the quarter-wave plate.

8. The method of claim 7, further comprising:

measuring an azimuth angle (A) of the radiation beam;

determining the value of the phase shift (δ

) between the two sub-beams prior to reflection from the substrate surface;

calculating a difference (d) between the intensities of the two sub-beams;

deriving a phase difference (Δ

) between the polarization direction of the sub-beams post-reflection; and

determining a property of the substrate surface resulting from a variation from a predetermined model of the phase difference (Δ

) between the two polarization directions of the two sub-beams.

9. The method of claim 8, wherein determining the value of the phase shift (δ

) comprises;

estimating a value of the phase shift (δ

) of the first sub-beam;

calculating the value of d for each pixel of a detected image of the sub-beams from the difference (d) in intensity (I) between each sub-beam (I_x, I_y), the phase difference (Δ

) between the reflectance coefficients (Rp, Rs) of the two sub-beams and the estimated phase shift (δ

); and

carrying out an optimization calculation to determine the correct value of δ

based on the calculated values of d.

10. The method of claim 9, wherein the value for d is calculated using the following equation:

d=I_y−

I_x.

11. The method of claim 9, wherein an estimated value of the phase shift of the first sub-beam is 1.5 radians.

12. The method of claim 1, wherein the adjusting further comprises:

rotating the grating to a non-orthogonal angle relative to a direction of the linearly polarized radiation beam.

13. The method of claim 12, wherein the non-orthogonal angle comprises 45 degrees.

14. An inspection apparatus comprising:

a radiation source configured to supply a radiation beam having linear-polarization;

an optical element configured to focus the radiation beam onto a substrate at a range of incident and azimuth angles such that the radiation beam reflects from the substrate;

a polarizing device configured to polarize the radiation beam into two different polarization directions;

a fixed phase-shifter configured to retard a first polarization direction by a predetermined amount so as to impose a fixed phase shift on the reflected radiation beam;

a controller configured to adjust at least one of the radiation beam, the substrate, the fixed phase-shifter, and the polarizing device to enable sensitivity to multiple polarization angles and sensitivity to detection of at least one of critical dimension, sidewall angle, and thickness; and

a detector system configured to detect simultaneously an angle-resolved spectrum of the two polarization directions of the radiation beam,

wherein the apparatus is specifically adapted to make the measurements when a grating on the substrate and the initial linear polarization of the radiation beam are angled non-orthogonally relative to each other.

15. The inspection apparatus of claim 14, wherein the controller is further configured to adjust the substrate to be at a non-orthogonal angle relative to a direction of the radiation beam.

16. The inspection apparatus of claim 14, wherein:

the fixed phase-shifter is situated along a first major axis of the inspection apparatus; and

the polarizing device is situated at a non-orthogonal angle relative to a second major axis of the inspection apparatus, the first and second major axes being orthogonal to one another.

17. A non-transitory computer-readable medium having computer program logic recorded thereon, execution of which, by a computing device, causes the computing device to perform operations comprising:

providing a radiation beam with linear polarization;

reflecting the linearly polarized radiation beam off a grating on a substrate at a range of incident and azimuth angles;

introducing a phase shift to the linearly polarized radiation beam thereby altering its polarization to elliptical;

splitting the reflected radiation beam into first and second orthogonally polarized sub-beams;

adjusting one or more of the linearly polarized radiation beam, the grating on the substrate, the phase shifter, and the beam splitter to enable sensitivity to multiple polarization angles and sensitivity to detection of at least one of critical dimension, sidewall angle, or thickness;

shifting a phase of the first sub-beams by a fixed amount with respect to the second sub-beam; and

simultaneously detecting an angle-resolved spectrum of both sub-beams;

wherein the grating and the initial linear polarization of the radiation beam are angled non-orthogonally relative to each other.

18. The non-transitory computer readable medium of claim 17, wherein the adjusting further comprises:

rotating the grating to a non-orthogonal angle relative to a direction of the linearly polarized radiation beam.