Low-maintenance coating technology

• US 8,696,879 B2
• Filed: 09/03/2010
• Issued: 04/15/2014
• Est. Priority Date: 09/14/2007
• Status: Active Grant

• Current Assignee: Cardinal CG Company (Cardinal Glass Industries Incorporated)
• Original Assignee: Cardinal CG Company (Cardinal Glass Industries Incorporated)
• Inventors: Myli, Kari B., Krisko, Annette J., German, John R., Hartig, Klaus
• Primary Examiner(s): MCDONALD, RODNEY GLENN
• Application Number:
  US12/875,208
• Publication Number:
  US 20100326816A1
• Time in Patent Office: 1,320 Days
• Field of Search: 204/298.12, 204/298.13, 204/298.21
• US Class Current: 204/298.13
• CPC Class Codes: C03C 17/002 for flat glass, e.g. float glass
• CPC Class Codes: C03C 17/2456 Coating containing TiO2
• CPC Class Codes: C03C 17/3411 with at least two coatings of inorganic materials C03C17/36, C03C17/42 take precedence
• CPC Class Codes: C03C 2217/212 TiO2
• CPC Class Codes: C03C 2217/219 CrOx, MoOx, WOx
• CPC Class Codes: C03C 2217/23 Mixtures
• CPC Class Codes: C03C 2217/71 Photocatalytic coatings
• CPC Class Codes: C03C 2217/91 Coatings containing at least one layer having a composition gradient through its thickness
• CPC Class Codes: C03C 2218/154 by sputtering
• CPC Class Codes: C23C 14/024 Deposition of sublayers, e.g. to promote adhesion of the coating C23C14/027 takes precedence
• CPC Class Codes: C23C 14/083 of refractory metals or yttrium
• CPC Class Codes: C23C 14/3464 using more than one target C23C14/56 takes precedence
• CPC Class Codes: C23C 14/352 using more than one target C23C14/56 takes precedence
• CPC Class Codes: Y10T 428/261 In terms of molecular thickness or light wave length
• CPC Class Codes: Y10T 428/265 1 mil or less
• CPC Class Codes: Y10T 428/31678 Of metal

Abstract

The invention provides methods and equipment for depositing a low-maintenance coating.

Claims

1. A sputtering target having a sputterable material comprising both titania and tungsten oxide, wherein the sputterable material includes:

i) tungsten in oxide form, ii) TiO, and iii) TiO2.

2. The sputtering target of claim 1 wherein substantially all the tungsten in the sputterable material is in oxide form.

3. The sputtering target of claim 1 wherein the sputterable material consists essentially of:

i) tungsten in oxide form, ii) TiO, and iii) TiO2.

4. The sputtering target of claim 1 wherein the target is a cylindrical rotary target, the sputterable material being carried on an exterior wall of an elongated backing tube, the elongated backing tube having a length of at least 24 inches, the target being adapted to rotate about a central axis to which the exterior wall of the backing tube is substantially parallel.