Method for manufacturing semiconductor device

• US 8,697,488 B2
• Filed: 08/15/2013
• Issued: 04/15/2014
• Est. Priority Date: 06/30/2009
• Status: Active Grant

• Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Original Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Inventors: Sasaki, Toshinari, Sakata, Junichiro, Ohara, Hiroki, Yamazaki, Shunpei
• Primary Examiner(s): Maldonado, Julio J
• Assistant Examiner(s): BACHNER, ROBERT G
• Application Number:
  US13/967,605
• Publication Number:
  US 20140011327A1
• Time in Patent Office: 243 Days
• Field of Search: 438/104, 257/E21.411, 257/E21.459
• US Class Current: 438/104
• CPC Class Codes: H01L 27/1225 with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
• CPC Class Codes: H01L 27/124 with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits wiring structures per se H01L23/52
• CPC Class Codes: H01L 29/24 including, apart from doping materials or other impurities, only semiconductor materials not provided for in groups H01L29/16, H01L29/18, H01L29/20, H01L29/22 including organic materials H10K99/00
• CPC Class Codes: H01L 29/42356 Disposition, e.g. buried gate electrode H01L29/42324 and H01L29/4234 take precedence
• CPC Class Codes: H01L 29/42384 for thin film field effect transistors, e.g. characterised by the thickness or the shape of the insulator or the dimensions, the shape or the lay-out of the conductor
• CPC Class Codes: H01L 29/66742 Thin film unipolar transistors
• CPC Class Codes: H01L 29/66969 of devices having semiconductor bodies not comprising group 14 or group 13/15 materials comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials, comprising cuprous oxide or cuprous iodide H01L21/02365
• CPC Class Codes: H01L 29/78606 with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device H01L29/78642, H01L29/78645 take precedence
• CPC Class Codes: H01L 29/78618 characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure silicide contacts, electrodes in general H01L29/458
• CPC Class Codes: H01L 29/7869 having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
• CPC Class Codes: H01L 29/78696 characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel H01L29/78612 takes precedence; transistors having a drain offset region or a lightly doped drain [LDD] H01L29/78621

Abstract

It is an object to provide a highly reliable semiconductor device which includes a thin film transistor having stable electric characteristics. It is another object to manufacture a highly reliable semiconductor device at lower cost with high productivity. In a method for manufacturing a semiconductor device which includes a thin film transistor where a semiconductor layer having a channel formation region, a source region, and a drain region are formed using an oxide semiconductor layer, heat treatment (heat treatment for dehydration or dehydrogenation) is performed so as to improve the purity of the oxide semiconductor layer and reduce impurities such as moisture. Moreover, the oxide semiconductor layer subjected to the heat treatment is slowly cooled under an oxygen atmosphere.

Claims

1. A method for manufacturing a semiconductor device comprising the steps of:

forming a first oxide semiconductor layer over a substrate;

forming a second oxide semiconductor layer over the first oxide semiconductor layer;

performing a first heat treatment on the first oxide semiconductor layer and the second oxide semiconductor layer in an inert atmosphere or under a reduced pressure in a chamber;

after the first heat treatment, introducing oxygen into the chamber; and

forming an insulating film containing oxygen in contact with the second oxide semiconductor layer.

2. The method for manufacturing a semiconductor device according to claim 1, wherein each of the first oxide semiconductor layer and the second oxide semiconductor layer includes indium, gallium and zinc.

3. The method for manufacturing a semiconductor device according to claim 1, further comprising the step of cooling the first oxide semiconductor layer and the second oxide semiconductor layer during the step of introducing oxygen into the chamber.

4. The method for manufacturing a semiconductor device according to claim 1, wherein the inert atmosphere contains nitrogen or a rare gas.

5. The method for manufacturing a semiconductor device according to claim 1, wherein the first heat treatment is performed by using a gas rapid thermal annealing method or a lamp rapid thermal annealing method.

6. The method for manufacturing a semiconductor device according to claim 1, wherein the first heat treatment is performed at a temperature higher or equal to 400°

C.

7. The method for manufacturing a semiconductor device according to claim 1, further comprising a step of performing a second heat treatment after forming the insulating film.

8. The method for manufacturing a semiconductor device according to claim 1, further comprising a step of performing a second heat treatment after forming the insulating film containing oxygen.

9. The method for manufacturing a semiconductor device according to claim 1, wherein the insulating film containing oxygen comprises a silicon oxide film or a silicon oxynitride film.

10. A method for manufacturing a semiconductor device comprising the steps of:

forming a first oxide semiconductor layer over a substrate;

forming a second oxide semiconductor layer over the first oxide semiconductor layer;

performing a first heat treatment on the first oxide semiconductor layer and the second oxide semiconductor layer in an inert atmosphere or under a reduced pressure in a chamber;

after the first heat treatment, introducing oxygen into the chamber; and

forming an insulating film containing oxygen in contact with the second oxide semiconductor layer,

wherein the second oxide semiconductor layer includes nanocrystals.

11. The method for manufacturing a semiconductor device according to claim 10, wherein each of the first oxide semiconductor layer and the second oxide semiconductor layer includes indium, gallium and zinc.

12. The method for manufacturing a semiconductor device according to claim 10, further comprising the step of cooling the first oxide semiconductor layer and the second oxide semiconductor layer during the step of introducing oxygen into the chamber.

13. The method for manufacturing a semiconductor device according to claim 10, wherein the inert atmosphere contains nitrogen or a rare gas.

14. The method for manufacturing a semiconductor device according to claim 10, wherein the first heat treatment is performed by using a gas rapid thermal annealing method or a lamp rapid thermal annealing method.

15. The method for manufacturing a semiconductor device according to claim 10, wherein the first heat treatment is performed at a temperature higher or equal to 400°

C.

16. The method for manufacturing a semiconductor device according to claim 10, further comprising a step of performing a second heat treatment after forming the insulating film.

17. The method for manufacturing a semiconductor device according to claim 10, further comprising a step of performing a second heat treatment after forming the insulating film containing oxygen.

18. The method for manufacturing a semiconductor device according to claim 10, wherein the insulating film containing oxygen comprises a silicon oxide film or a silicon oxynitride film.

19. A method for manufacturing a semiconductor device comprising the steps of:

forming a gate electrode over a substrate;

forming a gate insulating film over the gate electrode;

forming a first oxide semiconductor layer over the gate insulating film;

forming a second oxide semiconductor layer over the first oxide semiconductor layer;

performing a first heat treatment on the first oxide semiconductor layer and the second oxide semiconductor layer in an inert atmosphere or under a reduced pressure in a chamber;

after the first heat treatment, introducing oxygen into the chamber;

forming a drain electrode and a source electrode electrically connected to the second oxide semiconductor layer; and

forming a first insulating film containing oxygen in contact with the second oxide semiconductor layer.

20. The method for manufacturing a semiconductor device according to claim 19, wherein each of the first oxide semiconductor layer and the second oxide semiconductor layer includes indium, gallium and zinc.

21. The method for manufacturing a semiconductor device according to claim 19, further comprising the step of cooling the first oxide semiconductor layer and the second oxide semiconductor layer during the step of introducing oxygen into the chamber.

22. The method for manufacturing a semiconductor device according to claim 19, wherein the inert atmosphere contains nitrogen or a rare gas.

23. The method for manufacturing a semiconductor device according to claim 19, wherein the first heat treatment is performed by using a gas rapid thermal annealing method or a lamp rapid thermal annealing method.

24. The method for manufacturing a semiconductor device according to claim 19, wherein the first heat treatment is performed at a temperature higher or equal to 400°

C.

25. The method for manufacturing a semiconductor device according to claim 19, wherein the second oxide semiconductor layer includes nanocrystals.

26. The method for manufacturing a semiconductor device according to claim 19, further comprising a step of performing a second heat treatment after forming the first insulating film.

27. The method for manufacturing a semiconductor device according to claim 19, further comprising the steps of:

forming a second insulating film over the first insulating film, and

forming a pixel electrode electrically connected to one of the source electrode and the drain electrode, over the second insulating film.

28. The method for manufacturing a semiconductor device according to claim 19, wherein the first insulating film containing oxygen comprises a silicon oxide film or a silicon oxynitride film.